The use of methods of statistical analysis in signature recognition system based on Levenshtein distance

• Autorzy: Pałys M. , Doroz R. , Porwik P.
• Języki publikacji: EN

Abstrakty

EN

The study being presented is a continuation of the previous studies that consisted in the adaptation and use of the Levenshtein method in a signature recognition process. Three methods based on the normalized Levenshtein measure were taken into consideration. The studies included an analysis and selection of appropriate signature features, on the basis of which the authenticity of a signature was verified later. A statistical apparatus was used to perform a comprehensive analysis. The independence test ◈ was applied. It allowed determining the relationship between signature features and the error returned by the classifier.

Słowa kluczowe

EN

signature recognition; normalized Levenshtein distance; feature selection

PL

rozpoznawanie podpisu; znormalizowana odległość Levenshteina; wybór funkcji

• Wydawca: University of Silesia, Institute of Informatics, Computer Systems Department
• Czasopismo: Journal of Medical Informatics & Technologies
• Rocznik: 2012
• Tom: Vol. 21
• Strony: 67--73
• Opis fizyczny: Bibliogr. 10 poz., tab.

Twórcy

autor

Pałys M.

• University of Silesia, Institute of Computer Science, 41-200 Sosnowiec, Będzińska 39, Poland

autor

Doroz R.

autor

Porwik P.

Bibliografia

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• [2] DOROZ R., WRÓBEL K., PORWIK P., Signatures recognition method by using the normalized Levenshtein distances, Journal of Medical Informatics and Technologies, 2009, Vol. 1, pp. 73-78.
• [3] IMPEDOVO S., PIRLO G., Verification of handwritten signatures: an overview, 14th International Conference on Image Analysis and Processing (ICIAP’07), 2007, pp. 191-196.
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• [7] PARA T., MITAS M., Determining signatures’ characteristic features using statistical methods, Journal of Medical Informatics and Technologies, 2008, Vol. 1, pp. 41-50.
• [8] RABINER LAWRENCE R., A tutorial on hidden Markov models and selected applications in speech recognition, Proceedings Of The IEE, 1989, Vol. 77, No. 2.
• [9] SCHIMKE S., VIELHAUER C., DITTMANN J., Using adapted Levenshtein distance for on-line signature authentication, Proceedings of the 17th International Conference, 2004, Vol. 2, pp. 931-934.
• [10] WEIGEL A., FEIN F., Normalizing the weighted edit distance, Proc. 12th IAPR Int’l Conf. Pattern Recognition, Conf. B: Computer Vision and Image Processing, 1994, Vol. 2, pp. 399-402.