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Wielofunkcyjne cienkie warstwy wytwarzane w magnetronowym reaktorze plazmochemicznym

Autorzy
Dudek M.
Identyfikatory
Warianty tytułu
EN
Multifunctional thin films fabricated in magnetron plasmochemical reactor
Języki publikacji
PL
Abstrakty
PL
Przedmiotem rozprawy jest wykazanie, że dobór odpowiednich parametrów wyładowania jarzeniowego częstotliwości radiowej (ang. radio frequency - RF) może w sposób efektywny poprawić strukturę oraz właściwości mechaniczne, optyczne i elektryczne warstw wytwarzanych w procesie reaktywnego rozpylania magnetronowego. Cześć pierwsza rozprawy, obejmująca rozdział 1 i 2, zawiera przesłanki literaturowe, które legły u podstaw połączenia rozpylania magnetronowego z procesem RF PECYD - budowie magnetronowego reaktora plazmochemcznego. Obecność plazmy w sąsiedztwie stolika z próbkami jest dodatkowym źródłem jonów docierających do wzrastającej powierzchni warstwy, stymuluje dyfuzję powierzchniową „adatomów" odpowiedzialną za strukturę oraz właściwości formowanej cienkiej warstwy. Pozwala także na przeprowadzenie procesu osadzania bez dodatkowego wygrzewania próbki w trakcie procesu lub po jego zakończeniu, co jest istotne z punktu widzenia podłoży polimerowych o niskiej temperaturze mięknięcia. W drugiej części, w rozdziale 3 i 4, autor przedstawia wyniki badań wpływu potencjału autopolaryzacji na strukturę i właściwości użytkowe wielofunkcyjnych warstw. Rozdział 3 poświęcony jest cienkim warstwom ITO (tlenek indium domieszkowany cyną), natomiast rozdział 4 nanokompozytowym warstwom na bazie azotku tytanu. W przypadku ITO otrzymanego w procesie reaktywnego rozpylania magnetronowego wzrost intensywności bombardowania tworzonej powierzchni przez jony poprawia przezroczystość i przewodnictwo tego materiału. Wpływ potencjału autopolaryzacji na strukturę i właściwości użytkowych wielofunkcyjnych warstw jest ściśle związany z ciśnieniem podczas procesu osadzania warstw, a w szczególności z zawartością reaktywnego gazu w atmosferze roboczej. Zły dobór tych zewnętrznie kontrolowanych parametrów procesu może prowadzić do zubożenia właściwości tych warstw. W trzeciej części, rozdział 5, zaprezentowano wyniki przedstawiające wpływ zewnętrznie kontrolowanych parametrów wyładowania jarzeniowego RF na temperaturę podłoża. Pomiary z użyciem kamery termowizyjnej pokazują, że temperatura podłoża w wyniku oddziaływania plazmy z powierzchnią może osiągać bardzo wysokie wartości, powyżej temperatury mięknięcia większości materiałów polimerowych, a będących na granicy odpuszczania podłoży stalowych. Efekt nagrzewania się próbki poddanej działaniu plazmy RF jest tym skuteczniejszy, im jej kształt jest bardziej skomplikowany przy jednoczesnym bardzo wysokim stosunku rozwinięcia powierzchni do masy próbki. Podsumowująca dyskusja wyników otrzymanych przez autora, dotyczących obecności wyładowania jarzeniowego RF w sąsiedztwie wzrastającej powierzchni cienkiej warstwy oraz jego wpływu na mechanizm wzrostu warstwy w procesie reaktywnego rozpylania magnetronowego, strukturę i cechy użytkowe warstw wytwarzanych w tym procesie została przedstawiona w rozdziale 6. Praca zakończona jest rozdziałem 7, w którym autor przedstawia wnioski końcowe z przedstawionych w pracy wyników badań.
EN
The subject of dissertation is show that proper selection of parameters of radio frequency glow discharge can improve in effective way structure, mechanical, optical and electrical properties of films fabricated in reactive magnetron sputtering process. The first part of dissertation, contain chapter 1 and 2, include literature premise which placed under base of connection of magnetron sputtering with RF PECVD process. Presence of plasma in vicinity of samples holder is additional source of ion advanced to grown surface of film, stimulate of add-atoms surface diffusion responsible for structure and properties of deposited thin film. It also allow on fabricate of films without additional heating of sample during and after deposition process, what is important in the case of polymer substrate with low softening point. In the second part, chapter 3 and 4, author shows results of investigation of effect of self bias voltage on structure and properties of multifunctional films. The chapter 3 is attributed the thin ITO films (thin doped indium oxides), whereas chapter 4 nanocomposite titanium nitride - based films. In the case of ITO obtained in reactive magnetron sputtering process the increase ion bombardment of grow surface improve transparency and conductivity this materials. Effect of self bias voltage on structure and improve of utilize properties of multifunctional films is connected with pressure during the deposition process, in particular with contents of reactive gas in working atmosphere. Bad selection of these external controlled parameters of process can lead to depletion of properties of these films. In the third part (chapter 5) effect of external controlled parameters of radio frequency glow discharge on surface temperature is presented. Measurements using termographic camera shows that surface temperature in results of interaction with plasma can reach very high value. Temperature higher that melting point of majority polymers and on boundary of tempering temperature of steel substrate. Heating effect of sample put to interaction with plasma is the effective the shape of sample is more complicated with simultaneous high rate of development of surface to mass of sample. Summarizing discussion of obtained results concerning of presence of radio frequency glow discharge in vicinity of grow surface of thin film and there effect on mechanism of film grow during reactive magnetron sputtering process, structure and utilize characteristic of deposited films has been shown in chapter 6. The dissertation ended chapter 7, in which author shows final conclusion from presented in dissertation results of investigation.
Słowa kluczowe
PL
EN
Wydawca
Wydawnictwo Politechniki Łódzkiej
Czasopismo
Zeszyty Naukowe. Rozprawy Naukowe / Politechnika Łódzka
Rocznik
2010
Tom
Z. 400
Strony
3--88
Opis fizyczny
Bibliogr. 174 poz.
Twórcy
autor
Dudek M.
  • Zakład Inżynierii Biomedycznej Instytut Inżynierii Materiałowej Politechnika Łódzka
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