Microwave microdischarges of low-power at atmospheric pressure

• Autorzy: Jasiński M. , Goch M. , Zakrzewski Z. , Mizeraczyk J.
• Języki publikacji: EN

Abstrakty

EN

In this paper we present a simple and cheap microwave (2.45 GHz) source of microdischarges in argon and neon at atmospheric pressure. The source consisted of a cheap 2.45 GHz microwave magnetron generator and 50... coaxial line terminated with a simple coaxial plasma applicator. The new microwave source of microdischarges operated stable in the form of a smalI plasma jet at absorbed microwave powers of 9-80 W and gas flow rates of 0.5-25 l/min. The length and diameter of plasma jets were 1.5-14 mm and 0.5-1.5 mm, respectively, depending on the kind of gas, gas flow rate and microwave power absorbed by the discharge. The temperature of the plasma jets could be changed from 30°C to 1200°C by changing the gas flow rate or/and absorbed microwave power. The electron density in the plasma jet was around 3 . 10 _14 cm-3 1.1 .10 _15 cm -3, depending on the discharge conditions.

Słowa kluczowe

EN

microwave discharges; microplasma; Atmospheric pressure microplasma

• Wydawca: Wydawnictwo Instytutu Maszyn Przepływowych PAN
• Czasopismo: Transactions of the Institute of Fluid-Flow Machinery
• Rocznik: 2007
• Tom: nr 119
• Strony: 29--38
• Opis fizyczny: Bibliogr. 16 poz., rys.

Twórcy

autor

Jasiński M.

autor

Goch M.

autor

Zakrzewski Z.

autor

Mizeraczyk J.

• Centre for Plasma and Laser Engineering, The Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-952 Gdańsk, Poland,

Bibliografia

• [1] Kim J. and Terashima K.: Microwave excited nonequilibrium atmospheric pressure microplasmas for polymer surface modification, Proc. APSPT-4 2005, 324.
• [2] Iza F. and Hopwood J.: Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency, Plasma Sources Sei. Technol., 14, 2005, 397.
• [3] Kikuchi T., Hasegawa Y. and Shirai H.: RF microplasma jet at atmospheric pressure: characterization and application to thin film processing, J. Phys. D: Appl. Phys., 37, 2004, 1537.
• [4] Stonies R., Schermer S.,. Voges E and Broekaert J.A.C.: A new small microwave plasma torch, Plasma Sources Sei. Technol., 13, 2004, 604.
• [5] Bilgic A. M, Engel U., Voges E., Kuckelheim M. and Broekaert J.A.C.: A new low-power microwave plasma sources using microstrip technology for atomic emission spectrometry, Plasma Sources Sei. Technol., 9, 2000, 1.
• [6] Iza F. and. Hopwood J. A: Rotational, vibrational, and excitation temperature of a microwave-frequency microplasma, IEEE Transaction on Plasma Science, 32, 2004, 2.
• [7] Iza F. and Hopwood J. A.: Low-power microwave plasma source based on a microstrip split-ring resonator, IEEE Trans, on Plasma Science, 31, 2003, 4.
• [8] Stalder K. R., McMillen D. F. and Woloszko J.: Electrosurgical Plasmas, J. Phys. D: Appl. Phys., 38, 2005, 1728.
• [9] Sladek R.E.J, and Stoffels E.: Deactivation of Escherichia coli by the plasma needle, J. Phys. D: Appl. Phys., 38, 2005, 1716.
• [10] Park S. J., Chen J., Liu C. and Eden J. G.: Independently addressable subarrays of silicon microdischarge devices: electrical characteristics of large (30 x 30) arrays and excitation of a phosphor, Appl. Phys. Lett., 78. 2001. 419.
• [11] Kurunczi P., Lopez J., Shah H. and Becker K.: Excimer formation in high- pressure microhollow cathode discharge plasmas in helium initiated by low-energy electron collisions, Int. J. Mass Spectrom.. 20-5. 2001. 277.
• [12] Miclea M., Kunze K., Musa G., Franzke J. and Xiemax K.: The dielectric barrier discharge - a powerful microchip plasma for diode laser spectrometry, Spectrochim. Acta B, 56, 2001, 37.
• [13] Brandenburg R., Wagner H. E.,. Morozov A. M and Kozlov K. V.: Axial and radial development of the microdischarges of barrier discharges in N2/O2 mixtures at atmospheric pressure, J. Phys. D: Appl. Phys., 38, 2005, 1649.
• [14] Ichiki T., Koidesawa T. and Horiike Y.: An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample, Plasma Sources Sci. Technol., 12, 2003, 16.
• [15] Schermer S., Bings N. H.,. Bilgic A. M, Stonies R., Voges E. and Broekaert J.A C.: An improved microstrip plasma for optical emission spectrometry of gaseous species, Spectrochim. Acta B, 58, 2003, 1585.
• [16] Jasiński M., Mizeraczyk J. and Zakrzewski Z.: Spectroscopic measurements of electron density in microwave torch discharge at atmospheric pressure, Frontiers in Low Temperature Plasma Diagnostics VI, Les Houches, France, April 17-21, 2005, EP6-1-4.