Holographic imaging with a nanometer resolution using compact table-top EUV laser

• Autorzy: Wachulak P. W. , Marconi M. C. , Bartels R. A. , Menoni C. S. , Rocca J. J.
• Języki publikacji: EN

Abstrakty

EN

Holographic 2D/3D imaging with nanometer resolution using short wavelength extreme ultraviolet (EUV) light is presented in this paper. Gabor's holograms were recorded with a highly coherent table top EUV laser with different numerical apertures demonstrating ultimately a spatial resolution of 46+/-2 nm, comparable with the illumination wavelength, in 2D holographic imaging. Three dimensional images were obtained from a single high numerical aperture hologram recorded in a high resolution photoresist and numerically reconstructed at different image planes, allowing numerical optical sectioning with a lateral resolution ∼170 nm and depth resolution of 2.4 μm. The holograms were recorded in a high resolution photoresist and digitized with an atomic force microscope. To assess the spatial resolution of the numerical reconstructions of the holograms a correlation method was used. The algorithm allows for simultaneous estimation of the resolution and the feature size of the image under analysis.

Słowa kluczowe

EN

holography; EUV lasers; photoresist; numerical reconstruction; wavelength resolution

• Wydawca: Stowarzyszenie Elektryków Polskich ; Polska Akademia Nauk ; Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Opto-Electronics Review
• Rocznik: 2010
• Tom: Vol. 18, No. 1
• Strony: 80--90
• Opis fizyczny: Bibliogr. 34 poz., il., wykr.

Twórcy

autor

Wachulak P. W.

autor

Marconi M. C.

autor

Bartels R. A.

autor

Menoni C. S.

autor

Rocca J. J.

• Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Str., 00-908 Warsaw, Poland,

Bibliografia

• [1] D. Gabor: A new microscopic principle. Nature 161, 777, 1948.
• [2] A. V. Baez: A study in diffraction microscopy with special reference to X-rays. J. Opt. Soc. Am. 42, 756, 1952.
• [3] E. N. Leith and J. Upatnieks: Reconstructed wavefronts and communication theory. J. Opt. Soc. Am. 52, 1123, 1962.
• [4] H. H. Solak, D. He, W. Li, S. Singh, Gasson, F. Cerrina, B. H. Sohn, X. M. Yang and P. Nealey: Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography. Appl. Phys. Lett. 75, 2328, 1999.
• [5] P. W. Wachulak, M. G. Capeluto, C. S. Menoni, J. J. Rocca and M. C. Marconi, Opto-Electron. Rev. 16, 444-450, 2008.
• [6] J. W. Giles: Image reconstruction from a Fraunhofer X-ray hologram with visible light. J. Opt. Soc. Am. 59, 1179, 1969.
• [7] S. Aoki and S. Kikuta: X ray holographic microscopy. Jpn. J. Appl. Phys. 13, 1385, 1974.
• [8] I. McNulty, J. Kirz, C. Jacobsen, E. H. Anderson, M. R. Howells and D. P. Kern: High-resolution imaging by Fourier transform X-ray holography. Science 256, 1009-1012, 1992.
• [9] J. E. Trebes, S. B. Brown, E. M. Campbell, D. L. Matthews, D. G. Nilson, G. F. Stone and D. A. Whelan: Demonstration of X-ray holography with an X-ray laser. Science 238, 517, 1987.
• [10] C. Jacobsen, M. Howells, J. Kirz and S. Rothman: X-ray holographic microscopy using photoresists. J. Opt. Soc. Am. A. 7, 1847-1861, 1990.
• [11] S. Lindaas, H. Howells, C. Jacobsen and A. Kalinovsky: X-ray holographic microscopy by means of photoresist recording and atomic-force microscope readout. J. Opt. Soc. Am. A. 13, 1788-1800, 1996.
• [12] I. McNulty, J. Kirz, C. Jacobsen, E. Anderson, M. R. Howells and D. P. Kern: High resolution imaging by Fourier transform X-ray holography. Science 256, 1009, 1992.
• [13] D. Sayre, H. N. Chapman and J. Miao: On the extendibility of X-ray crystallography to noncrystals. Acta Crystallogr. A 54, 232-239, 1998.
• [14] S. Elsebitt, W. F. Schlotter, M. Lorgen, O. Hellwig, W. Eberhardt and J. Stohr: Lensless imaging of magnetic nanostructures by X-ray spectro holography. Nature 432, 885, 2004.
• [15] R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murnane, S. Backus, I. P. Christov, Y. W. Liu, D. Attwood and C. Jacobsen: Generation of spatially coherent light at extreme ultraviolet wavelengths. Science 297, 376-378, 2002.
• [16] A. S. Morlens, J. Gautier, G. Rey, P. Zeitoun, J. P. Caumes, M. Kos-Rosset, H. Merdji, S. Kazamias, K. Casson and M. Fajardo: Submicrometer digital in-line holographic microscopy at 32 nm with high-order harmonics. Opt. Lett. 31, 3095-3097, 2006.
• [17] R. I. Tobey, M. E. Siemens, O. Cohen, M. M. Murnane, H. C. Kapteyn and K. A. Nelson: Ultrafast extreme ultraviolet holography: dynamic monitoring of surface deformation. Opt. Lett. 32, 286-288, 2007.
• [18] P. Wachulak, R. Bartels, M. C. Marconi, C. S. Menoni, J. J. Rocca, Y. Lu and B. Parkinson: Sub 400 nm spatial resolution extreme ultraviolet holography with a table top laser. Opt. Express 14, 9636-9642, 2006.
• [19] P. Wachulak, M. C. Marconi, R. Bartels, C. S. Menoni and J. J. Rocca: Volume extreme ultraviolet holographic imaging with numerical optical sectioning. Opt. Express 15, 10622-10628, 2007.
• [20] J. W. Goodman, Introduction to Fourier Optics, McGraw Hill, Chap. 4, p. 66, 1996.
• [21] U. Schnars and W. P. O. Juptner: Digital recording and reconstruction of holograms in hologram interferometry and shearography. Appl. Optics 33, 4373-4377, 1994.
• [22] U. Schnars and W. P. O. Juptner: Digital recording and numerical reconstruction of holograms. Meas. Sci. Technol. 13, R85-R101, 2002.
• [23] A. C. F. Hoole, M. E. Welland and A. N. Broers: Negative PMMA as a high-resolution resist - the limits and possibilities. Semicond. Sci. Technol. 12, 1166-1170, 1997.
• [24] K. Yamazaki, T. Yamaguchi and H. Namatsu: Three-dimensional nanofabrication with 10-nm resolution. Jpn. J. Appl. Phys. 43, L1111-L1113, 2004.
• [25] J. M. Heck, D. T. Attwood, W. Meyer-Ilse and E. H. Anderson: Resolution determination in X-ray microscopy: an analysis of the effects of partial coherence and illumination spectrum. J. X-Ray Sci. Technol. 8, 95, 1998.
• [26] D. Attwood, Soft X-ray and Extreme Ultraviolet Radiation, Cambridge University Press, 1999.
• [27] CXRO, http://www-cxro.lbl.gov/
• [28] P. W. Wachulak, M. C. Marconi, R. A. Bartels, C. S. Menoni and J. J. Rocca: Soft X-ray laser holography with wavelength resolution. J. Opt. Soc. Am. B 25, 1811, 2008.
• [29] P. W. Wachulak, C. A. Brewer, F. Brizuela, W. Chao, E. H. Anderson, R. A. Bartels, C. S. Menoni, J. J. Rocca and M. C. Marconi: Simultaneous determination of feature size and resolution in soft X-ray microscopy images. J. Opt. Soc. Am. B 25, B20-B26, 2008.
• [30] Y. Liu, M. Seminario, F. G. Tomasel, C. Chang, J. J. Rocca and D. T. Attwood: Achievement of essentially full spatial coherence in a high-average-power soft-X-ray laser. Phys. Rev. A 6303, 033802, 2001.
• [31] H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang and P. Nealey: Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography. Appl. Phys. Lett. 75, 2328-2330, 1999.
• [32] From Polysciences Inc.
• [33] G. L. Rogers: Gabor diffraction microscopy. The hologram as a generalized zone-plate. Nature 166, 236-237, 1950.
• [34] Y. Wang, E. Granados, M. A. Larotonda, M. Berrill, B. M. Luther, D. Patel, C. S. Menoni and J. J. Rocca: High-brightness injection-seeded soft-X-ray-laser amplifier using a solid target. Phys. Rev. Lett. 97, 123901, 2006.