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This paper presents current technology used to produce 100 cm² multicrystalline silicon solar cells of efficiency above 13% which was one of the main goals of the National Photovoltaic Project undertaken in the Institute of Metallurgy and Materials Science (IMMS). The general concept of the technology consists of maximum seven steps. The process sequence is based on diffusion from POCl₃ and screen printed contacts fired through a PECVD Six Ny or TiOx antireftlection coating (ARC). Co-metallisation annealing was performed in an IR furnace. The multicrystalline wafers are described using four-point probe, scanning electron microscopy (SEM), secondary ion mass spectrometer, and spectrophotometer with an integrating sphere. The completed solar cells are characterized with internal spectral response and a current-voltage characteristic. All aspects palying a role in a suitable manufacturing process are discussed. At present, multicrystalline silicon solar cells capture around a 45% share of the world photovoltaics market with a total of 540 MW being produced in 2002. Taking into account the decreasing cost of multicrystalline substrates, this relation will rise systematically.
Słowa kluczowe
Wydawca
Czasopismo
Rocznik
Tom
Strony
269--275
Opis fizyczny
Bibliogr. 11 poz., rys., tab., wykr.
Twórcy
autor
- Polish Academy of Sciences, Institute of Metallurgy and Materials Science, 25 Reymonta Str., 30-059 Cracow, Poland
autor
- Polish Academy of Sciences, Institute of Metallurgy and Materials Science, 25 Reymonta Str., 30-059 Cracow, Poland
autor
- Polish Academy of Sciences, Institute of Metallurgy and Materials Science, 25 Reymonta Str., 30-059 Cracow, Poland
autor
- Silesian Technical University, Institute of Electronics, 16 Akademicka Str., 44-100 Gliwice, Poland
autor
- Polish Academy of Sciences, Institute of Metallurgy and Materials Science, 25 Reymonta Str., 30-059 Cracow, Poland
Bibliografia
- 1. A. Goetzberger, J. Knobloch, and B. Voss, Crystalline Silicon Solar Cells, John Wiley & Sons, Chichester, England, 1998.
- 2. M. Lipinski, P. Panek, Z. Swiątek, E. Beltowska, and R. Ciach, "Double porous silicon layer on multi-crystalline Si for photovoltaic application", Solar Energy Materials & Solar Cells 72, 271-276 (2002).
- 3. V. Y Yerokhov, M. Lipinski, R. Ciach, H. Nagel, A. Mylyanych, and P. Panek, "Cost-effective methods of texturing for silicon solar cells", Solar Energy Materials & Solar Cells 72, 291-298 (2002).
- 4. K. Waczynski, K. Drabczyk, M. Lipinski, and P. Panek, "Doping technology using silica glasses investigation of the emitter layer of the silicon solar cell", Proc. Int. Conf. IMAPS XX.VI, 221-224 (2002).
- 5. P. Panek, M. Lipinski, R. Ciach, K. Drabczyk, and E. Bielanska, "The infrared processing in multicrystalline silicon solar cell low-cost technology", Solar Energy Materials & Solar Cells 76, 529-534 (2003).
- 6. F. Duerinckx, J. Szlufcik, A. Ziebakowski, J. Nijs, and R. Mertens, "Simple and efficient screen printing process for multicrystalline silicon solar cells based on firing through silicon nitride", Proc. European Photovoltaic Solar Energy Conf. 14, 792-795 (1997) .
- 7. B.S. Richards , J.E. Cotter, C.B. Honsberg, and S.R. Wenham, "Novel u es of TiO2 in crystalline silicon solar cells", Proc. IEEE 28, 375-378 (2000).
- 8. S. Bowden, F. Dueinckx, J. Szlufcik, and J. Nijs, "Rear passivation of thin multicrystalline silicon solar cells", Opto-Electron. Rev. 8, 307-310 (2000).
- 9. T. Zdanowicz, "The interactive computer program to fit I-V curves of solar cells", Proc. European Photovoltaic Solar Energy Conf 12, 1311-1314 (1994).
- 10. J. Szlufcik, F. Duerinckx, J. Horzel, E. van Kerschaver, R. Einhaus, K. De Clercq, H. Dekkers, and J. Nijs, "Advanced concept of industrial technologies of crystalline silicon solar cells", Opto-Electron. Rev. 8, 299-306 (2000).
- 11. Information in "News" of Renewable Energy World 8, 12 (2003).
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BWA2-0008-0038