Optimisation of SiNx:H layer for multicrystalline silicon solar cells

• Autorzy: Lipiński M. , Zięba P. , Jonas S. , Kluska S. , Sokołowski M. , Czternastek H.
• Konferencja: XVII School of Optoelectronics : Photovoltaics-Solar Cells and Detector ; (17. ; 13.10-17.10.2003 , Kazimierz Dolny, Poland)
• Języki publikacji: EN

Abstrakty

EN

Amorphous hydrogenated silicon nitride (a-SiNx:H) films were prepared by a plasma–enhanced chemical vapour deposition in a conventional direct plasma reactor operating at 13.56 MHz using a mixture of the silane (SiH₄) and ammonia (NH₃). The reflectance of SiNx films deposited onto Cz-Si polished wafers substrates was measured in the range of 300–1200 nm. The wavelength dependence of the refractive index n and the extinction coefficient k was determined by fitting a Cauchy model to the experimental reflectance. The influence of the flow NH₃/SiH₄ ratio on the optical constant n and k of SiNx films is presented. An optimisation of the antireflection coating on the flat and texturised substrate for encapsulated and non-encapsulated solar cells was performed using the SUNRAYS program.

Słowa kluczowe

EN

silicon nitride; silicon solar cell; antireflection coating

• Wydawca: Stowarzyszenie Elektryków Polskich ; Polska Akademia Nauk ; Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Opto-Electronics Review
• Rocznik: 2004
• Tom: Vol. 12, No. 1
• Strony: 41--44
• Opis fizyczny: Bibliogr. 14 poz.

Twórcy

autor

Lipiński M.

• Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta Str., 30-059 Cracow, Poland

autor

Zięba P.

• Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta Str., 30-059 Cracow, Poland

autor

Jonas S.

• AGH-University of Science and Technology, 30 Mickiewicza Ave., 30-059 Cracow, Poland

autor

Kluska S.

• AGH-University of Science and Technology, 30 Mickiewicza Ave., 30-059 Cracow, Poland

autor

Sokołowski M.

• AGH-University of Science and Technology, 30 Mickiewicza Ave., 30-059 Cracow, Poland

autor

Czternastek H.

• AGH-University of Science and Technology, 30 Mickiewicza Ave., 30-059 Cracow, Poland

Bibliografia

• 1. A. Rohatgi, V.Yelundur, J. Jeong, A. Ebong, D. Meier, A.M. Babor, and M.D. Rosenblum, “Aluminium–enhanced PECVD SiNx hydrogenation in silicon ribbons”, Proc. 16th European Photovoltaic Solar Energy Conf., 1120–1123 (2000).
• 2. F. Duerinkx and J. Szlufcik, Solar Energy Materials & Solar Cells 72, 231–246 (2002).
• 3. Z. Chen and A. Rochatgi, “Silicon surface and bulk defect passivation by low temperature PECVD oxides and nitrides”, Proc. 1st World Conf. and Exhibition on Photovoltaic Solar Energy Conversion, 1331–1334 (1994).
• 4. D.S. Ruby, W. L. Wilbanks and C. B. Fleddermann, “A statistical analysis of the effect of PECVD deposition parameters on surface and bulk recombination in silicon solar cells”, Proc. 1st World Conf. and Exhibition on Photovoltaic Solar Energy Conversion, 1335–1334 (1994).
• 5. A.G. Aberle and R. Hezel, “Progress in low-temperature surface passivation of silicon solar cells using remote-plasma silicon nitride”, Progress in Photovoltaics 5, 29–50 (1997).
• 6. B. Lenkeit and R. Hezel, “Improved understanding of the surface-passivating properties of RPECVD silicon nitride on p-type crystalline silicon”, Proc. 17th European Photovoltaic Solar Energy Conf., 342–346 (2001).
• 7. A.G. Aberle, T. Lauinger, and R. Hezel, “Remote PECVD silicon nitride – a key technology for the crystalline silicon PV industry of the 21st century”, Proc. 14th European Photovoltaic Solar Energy Conf., 684–689 (1997).
• 8. R. Ekai, M. Verbeek, H. Nagel, R. Auer, A. Aberle, and R. Hezel, “Optimisation of SiN antireflection coatings for encapsulated and non-encapsulated silicon solar cells with V-groove surface texture”, Proc. 2nd World Conf. and Exhibition on Photovoltaic Solar Energy Conversion, Vienna, Austria, 1430–1433 (1998).
• 9. H. Nagel, A.G. Aberle, and R. Hezel, “Determination of optical constants of semitransparent films and substrates for silicon solar cell application”, Proc. 2nd World Conf. and Exhibition on Photovoltaic Solar Energy Conversion., 1422–1425 (1998).
• 10. H. Nagel, A.G. Aberle, and R. Hezel, “Optimised antireflection coatings for planar silicon solar cells using remote PECVD silicon nitride and porous silicon dioxide”, Progress in Photovoltaics 7, 245–260 (1999).
• 11. F. Duerinckx, J. Szlufcik, A. Ziebakowski, J. Nijs, and R. Mertens, “Simple and efficient screen printing process for multicrystalline silicon solar cells based on firing through silicon nitride”, Proc. 14th European Photovoltaic Solar Energy Conf., 792–795 (1997).
• 12. R. Brendel, “Sunrays: A versatile ray tracing program for the photovoltaic community”, Proc. 12th European Photovoltaic Solar Energy Conf., 1339–1342 (1994).
• 13. SUNRAYS program 1.3 and user manual is distributed by Garching Innovation GmbH, c/o M. Pasecky, Königinstr. 19, D-80539 München, Germany, Fax [phone].
• 14. M. Rubin, “Optical properties of soda lime silica glasses”, Solar Energy Materials 12, 275–288 (1985).