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InNAs : a new optoelectronic material for mid-infrared applications

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Języki publikacji
EN
Abstrakty
EN
The InNx As1-x alloy is a very promissing, although so far almost completely unexplored, novel material for mid-IR emitters and detectors. InNAs/GaAs multiple quantum wells were grown by MOCVD on GaAs substrates, using dimenthylhydrazine (DMHy) as nitrogen precursor. The crystalline quality and solid phase composition were evaluated by high-resolution x-ray diffraction. The nitrogen content in InNAs wells was determined to be 18%. The measurements indicate high quality of quantum-well structures. The peak photoluminescence emission wavelengths of ~6.5 um at 30 K and ~7.2 um at 193 K are the longest reported so far for dilute nitride semiconductors.
Twórcy
autor
  • Centre for High Technology Materials, University of New Mexico, 313 Goddard SE, Albuquerque, New Mexico 87106-4343, USA, osinski@chtm.unm.edu
Bibliografia
  • 1. C.L. Felix, W.W. Bewley, I. Vurgaftman, R.E. Bartolo, D.W. Stokes, J.R. Meyer, M.J. Yang, H. Lee, R.J. Menna, R .U. Martinelli, D.Z. Garbuzov, J.C. Connolly, M. Maiorov, A.R. Sugg, and G.H. Olsen, "Midinfrared W quantum-well lasers for noncryogenic continuous-wave operation", Appl. Opt. 40, 806-811 (2001).
  • 2. W.W. Bewley, H. Lee, I. Vurgaftman, R.J. Menna, C.L. Felix, R.U. Martinelli, D.W. Stokes, D.Z. Garbuzov, J.R. Meyer, M. Maiorov, J.C. Connolly, A.R. Sugg, and G.H. Olsen, "Continuous-wave operation of λ = 3.25 μm broadened-waveguide W quantum-wen diode lasers up to T = 195 K", Appl. Phys. Lett. 76, 256-258 (2000).
  • 3. C. Gmachl, F. Capasso, D.L. Sivco, and A.Y. Cho, "Recent progress in quantum cascade laser and applications", Rep. Progress Phys. 64, 1533-1601 (2001).
  • 4. M. Beck, D . Hofstetter, T. Aellen, J. Faist, U. Oesterle, M. Ilegems, E. Gini, and H. Melchior, "Continuous wave operation of a mid-infrared semiconductor laser at room temperature", Science 295, 301-305 (2002).
  • 5. T. Yang, S. Nakajima, and S. Sakai, "Tight-binding calculation of electronic structures of InNAs ordered alloys", Jpn. J. Appl. Phys. 36 , L320 (1997).
  • 6. H. Naoi, Y. Naoi, and S. Sakai, "M OCVD growth of InAsN for infrared application ", Solid-State Electron. 41, 319-321 (1997).
  • 7. J.S. Wang, H.H. Lin, L.W. Song, and G.R. Chen, "Growth of InAsN/InGaAs(P) quantum wells on InP by gas source molecular beam epitaxy", J. Vae. Sci. & Technol. B19, 202 (2001).
  • 8. A.A. El-Emawy, H.J. Cao, E. Zhmayev, J.H. Lee, D. Zubia, and M. Osiński, "MOCVD growth of InNxAs1-x on GaAs using dimethylhydrazine", Phys. Stat. Sol. (b) 228, 263-267 (2001).
  • 9. H.J. Cao, N. Nuntawong, A.A. El-Emawy, and M. Osiński, "Characterisation of MOCVD-grown InNAs/GaA quantum wells", 23rd Annual Conf on Lasers and Electro-Optics CLEO 2002, Long Beach, CA, 19-24 May 2002, 653-654 (2002).
  • 10. M. Osiński, N. Nuntawong, H.J. Cao, E. Zhmayev, and A.A El-Emawy, "MOCVD growth and characterisation of InNAs on GaAs - a new narrow-gap semiconductor (lnvited Paper)", Proc. Narrow Bandgap Optoelectronic Materials and Devices Symp., Electrochem. Soc. Meeting, Salt Lake City, UT, 21 Oct. 2002, 60-71 (2002).
  • 11. Y.C. Kao, T.P.E. Broekaert, H.Y. Liu, S. Tang, I.H. Ho and G.B. Stringfellow, "Lattice-matched InAsN (x = 0.38) on GaAs grown by molecular beam epitaxy", Proc. MRS Symp. III-Nitride, SiC and Diamond Materials for Electronic Devices, San Francisco, CA, 8-12 April, 335-340 (1996).
  • 12. H. Naoi, D. M. Shaw, Y. Naoi, G.J. Collins, and S. Sakai, "Growth of InNAs by low-pressure metalorganic chemical vapour deposition employing microwave-cracked nitrogen and in situ generated arsine radicals", J. Cryst. Growth 222, 511-517 (2001).
  • 13. R. Beresford, K.S. Stevens, and A.F. Schwartzman, "Micro structure and composition of InAsN alloys grown by plasma-source molecular beam epitaxy", J. Vae. Sci. & Technol. B16, 1293 (1998).
  • 14. W.K. Hung, K.S. Cho, M.Y. Chern, Y.F. Chen, D.K. Shih, H.H . Lin, C.C. Lu, and T.R. Yang, "Nitrogen-induced enhancement of the electron effective mass in InNxAs1-x", Appl. Phys. Lett. 80, 796-798 (2002).
  • 15. P.F. Fewster, V. Holy, and N.L. Andrew, "Detailed structural analysis of semiconductors with X-ray scattering", Materials Science in Semiconductor Processing 4, 475-481 (2001).
  • 16. S. Pereira, M.R. Correia, E. Pereira, K.P. O'Donnell, E. Alves, AD. Sequeira, N. Franco, LM. Watson, and C.J. Deatcher, "Strain and composition distributions in wurtzite InGaN/GaN layer extracted from x-ray reciprocal space mapping", Appl. Phys. Lett. 80, 3913-3915 (2002).
  • 17. N. Tit and M.W.C. Dharma-wardana, "Electronic structure of InNxAs1-x alloys from tight-binding calculations", Appl. Phys. Lett. 76 , 3576-3578 (2000).
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BWA1-0005-0021
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