A defect study of self-assembled monolayers by chemical etching

• Autorzy: Cyganik P. , Felgenhauer T. , Rong H. T. , Buck M. , Postawa Z.
• Konferencja: Surface and Thin Film Structures' 1999 (7 ; 15-18.09.1999 ; Kazimierz Dolny, Poland)
• Języki publikacji: EN

Abstrakty

EN

Self-assembled monolayers (SAMs) of 4-methyl-4'-mercaptoethyl-biphenyl (HS-CH₂-CH₂-C₆H₄-C₆H₄-CH₃) and nexadecane thiol (HS-(CH₂)₁₅-CH₃ adsorbed on Au(111)/mica were investigated by cyanide etching in order to identify defects in the monolayer. The etch pits formed around a defect were examined ex situ by scanning tunneling microscopy. For both tiols removal of gold atoms begins in the vicinity of terrace edges and leads to the formation of triangular pits on the gold terraces. The defect densities of both thiols are comparable and the etch rate slightly higher for the alkane thiol compared to the biphenyl thiol. This feature combined with a charge permeability orders of magnitude higher than for alkane thiols makes biphenyl based thiols a promising material for modifying electrochemical properties of electrodes.

• Wydawca: Institute of Electron Technology
• Czasopismo: Electron Technology
• Rocznik: 2000
• Tom: Vol. 33, No. 3
• Strony: 337--343
• Opis fizyczny: Bibliogr. 35 poz.

Twórcy

autor

Cyganik P.

autor

Felgenhauer T.

autor

Rong H. T.

autor

Buck M.

autor

Postawa Z.

• Institute of Physics, Jagiellonian University, ul.Reymonta 4, 30-059 Kraków, Poland