The simulation of laser correction of thick film resistors with the boundary elements method use

• Autorzy: Borecki M. , Kruszewski J. , Kopczyński K.
• Języki publikacji: EN

Abstrakty

EN

The laser correction of resistors is widely used nowadays in hybrid circuit production. In the article the Boundary Element Method (BEM) [1] is presented as a way of simulation of laser correction cutting of thick layer resistors. The paper also shows the difference between the simulation of corection cutting and the simulation of laser correction interpreted as a technological process. In reality, only the provess simulation enables correct setup of its parameters and as a result allows avoiding costly experiments connected with production of big number of test runs.

• Wydawca: Institute of Electron Technology
• Czasopismo: Electron Technology
• Rocznik: 2000
• Tom: Vol. 33, No. 4
• Strony: 571--576
• Opis fizyczny: Bibliogr. 10 poz

Twórcy

autor

Borecki M.

autor

Kruszewski J.

autor

Kopczyński K.

• Institute of Microelectronics and Optoelectronics, Warsaw Universitu of Technology ul. Koszykowa 75, 00-662 Warszawa, Poland