Structural and magnetic properties of the Co-sputtered Fe-ceramic thin film

• Autorzy: Yu S. C. , Kim W. T , Han S. H. , Kim H. J.
• Konferencja: Korean-Polish Joint Seminar on Physical Properties of Magnetic Materials (3 ; 26-28.08.1997 ; Kraków, Poland)
• Języki publikacji: EN

Abstrakty

EN

The structure and magnetic properties of Fe-ceramics (Si₃N₄, Al₂O₃) thin films fabricated gy an rf magnetron co-sputtering technique were studied by X-ray diffractometry, magnetometry and electrical resustivity measurement. The concentration of Fe in the film decreases linearly with the area fraction of ceramic pieces on the target. As the area fraction of the ceramic pieses increases, the phase of thin film changes from bcc crystaline phase to amorphous phase, and the magnetization of the film decreased due to the decrease of Fe content and also due to the decreased of grain size. The electrical resistivity of thin films increases significantly with decreasing Fe content. Saturation magnetization of co-sputtered thin films could be explained by a mixture of two types of particles showing paramagnetism and ferromagnetism.

• Wydawca: Institute of Electron Technology
• Czasopismo: Electron Technology
• Rocznik: 1998
• Tom: Vol. 31, No. 1
• Strony: 102--107
• Opis fizyczny: Bibliogr. 6 poz.

Twórcy

autor

Yu S. C.

autor

Kim W. T

autor

Han S. H.

autor

Kim H. J.

• Department of Physics, Chungbuk National University, Cheongju, 360-763, Korea