Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Wachulak, P. W.; Marconi, M. C.; Isoyan, A.; Urbanski, L.; Bartnik, A.; Fiedorowicz, H.; Bartels, R. A.

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Tytuł artykułu

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Autorzy

Wachulak P. W. , Marconi M. C. , Isoyan A. , Urbanski L. , Bartnik A. , Fiedorowicz H. , Bartels R. A.

Wybrane pełne teksty z tego czasopisma

http://journals.pan.pl/dlibra/journal/opelre

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Warianty tytułu

Języki publikacji

Abstrakty

Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.

Słowa kluczowe

EUV holography computer-generated holograms Talbot imaging lens-less diffraction imaging Fresnel zone plate microscopy nanometer resolution coherent EUV imaging incoherent EUV imaging

Wydawca

Stowarzyszenie Elektryków Polskich
Polska Akademia Nauk
Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego

Czasopismo

Opto-Electronics Review

Rocznik

2012

Tom

Vol. 20, No. 1

Strony

1--14

Opis fizyczny

Bibliogr. 66 poz., wykr.

Twórcy

autor

Wachulak P. W.

autor

Marconi M. C.

autor

Isoyan A.

autor

Urbanski L.

autor

Bartnik A.

autor

Fiedorowicz H.

autor

Bartels R. A.

Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Str., 00-908 Warsaw, Poland, wachulak@gmail.com

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