Nanopatterning in a compact setup using table top extreme ultraviolet lasers

• Autorzy: Wachulak P. W. , Capeluto M. G. , Menoni C. S. , Rocca J. J. , Marconi M. C.
• Języki publikacji: EN

Abstrakty

EN

The recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd's mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500x500 µm².

Słowa kluczowe

EN

nanopatterning; interferometric lithography; EUV lasers; photoresist

• Wydawca: Stowarzyszenie Elektryków Polskich ; Polska Akademia Nauk ; Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Opto-Electronics Review
• Rocznik: 2008
• Tom: Vol. 16, No. 4
• Strony: 444--450
• Opis fizyczny: Bibliogr. 26 poz., il.

Twórcy

autor

Wachulak P. W.

autor

Capeluto M. G.

autor

Menoni C. S.

autor

Rocca J. J.

autor

Marconi M. C.

• NSF ERC for Extreme Ultraviolet Science & Technology and Department of Electrical and Computer Engineering, Colorado State University, Colorado, USA,

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