Ion implantation followed by laser/pulsed plasma/ion beam annealing : a new approach to fabrication of superconducting MgB2 thin films

• Autorzy: Piekoszewski J. , Werner Z. , Barlak M. , Kolitsch A. , Szymczyk W.
• Języki publikacji: EN

Abstrakty

EN

The paper presents a new approach to formation of superconducting MgB2 thin films: ion implantation followed by annealing in an unconventional second step treatment using pulsed laser, plasma, or ion beams. Merits and drawbacks of individual approaches are discussed.

Słowa kluczowe

EN

MgB2; superconducting films; pulsed plasma annealing

• Wydawca: Institute of Nuclear Chemistry and Technology
• Czasopismo: Nukleonika
• Rocznik: 2008
• Tom: Vol. 53, No. 1
• Strony: 7--10
• Opis fizyczny: Bibliogr. 16 poz., rys.

Twórcy

autor

Piekoszewski J.

autor

Werner Z.

autor

Barlak M.

autor

Kolitsch A.

autor

Szymczyk W.

• Department of Material Studies, The Andrzej Sołtan Institute for Nuclear Studies, 05-400 Otwock/Świerk, Poland and Institute of Nuclear Chemistry and Technology, 16 Dorodna Str., 03-145 Warsaw, Poland

Bibliografia

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