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The properties of the Langmuir monolayer formed by tri-n-octylphosphine oxide (TOPO) have been analyzed. The investigations were based both on traditional (surface potential measurements) and more advanced (the relative reflectivity using Brewster angle microscopy BAM) experimental techniques and, for better analysis, the semiempirical computation using HyperChem programme has been done. Moreover, detailed characteristics of the relaxation behaviour of TOPO monolayers have been performed. It has been found that with the increase of the surface pressure () the film thickness increases, and TOPO monolayer becomes denser; however its state does not change. Upon film compression, the reorientation of TOPO molecules occurs in this way that they become progressively more perpendicular to the surface until the collapse of the monolayer. The relaxation of TOPO monolayers formed both on water subphase as well as on NaCl solution of various concentrations were analyzed according to two-steps desorption mechanism. As it turned out, the stability of TOPO monolayer decreases with the surface pressure. At lower the loss of the monolayer material is controlled both by dissolution and diffusion mechanism, while at higher surface pressure the monolayer relaxation is controlled by two dissolution steps of different rates and the monolayer does not achieve a steady-state. Moreover, the monolayer stability increases with ionic strength.
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Tom
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115--127
Opis fizyczny
Bibliogr. 28 poz., rys.
Twórcy
autor
autor
- Department of Physical Chemistry and Electrochemistry, Faculty of Chemistry, Jagiellonian University, Ingardena 3, 30-060 Kraków, Poland
Bibliografia
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Bibliografia
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bwmeta1.element.baztech-article-BUJ5-0008-0017