Voltametric Behavior of the Nitro Radical Anion Generated Electrochemically from Furazolidone at Glassy Carbon Electrode

• Autorzy: Fotouhi L. , Kiapasha L.
• Języki publikacji: EN

Abstrakty

EN

The electrochemical behavior of the nitro radical anion resulted from the reduction of furazolidone has been studied in mixed aqueous-dimethylformamide (DMF) solvent at glassy carbon electrode (GCE) by cyclic voltammetry (CV) and differential pulse voltammetry (DPV). Furazolidone is reduced in two cathodic steps in the low concentration of DMF and acidic media, giving hydroxylamine and amine derivatives via reduction by four and two electrons, respectively. The addition of DMF to the basic buffer solution enables the presence of two different reduction processes to be established. The first cathodic peak is related to a 1e-reversible reduction process corresponding to the formation of nitro anion radical (RNO2 Ĺ ) and the more negative peak is due to the formation of hydroxylamine via a 3e-irreversible reduction process. The cyclic voltammetry technique has been employed to the study of RNO2/RNO2 Ĺ couple. The reversibility of radical anion is investigated by the ratio of anodic to cathodic current, Ia1/Ic1, by increasing DMF content and pH. The influence of scan rate on the Ia1/Ic1 ratio shows an ECi mechanism, in which this subsequent chemical reaction corresponds to protonation reaction ofRNO2 Ĺ that is initiated electrochemically. The effect of cationic and anionic surfactants has been reported on the electrochemical behavior of furazolidone.

Słowa kluczowe

EN

voltammetry; electrochemistry; furazolidone; nitro radical; surfactant

• Wydawca: Polskie Towarzystwo Chemiczne
• Czasopismo: Polish Journal of Chemistry
• Rocznik: 2004
• Tom: Vol.78 /nr 11-12
• Strony: 2175--2184
• Opis fizyczny: Bibliogr. 27 poz., rys.

Twórcy

autor

Fotouhi L.

• Department of Chemistry, Faculty of Science, Alzahra University, Vanak, P. O. Box 1993891176, Tehran, Iran

autor

Kiapasha L.

• Department of Chemistry, Faculty of Science, Alzahra University, Vanak, P. O. Box 1993891176, Tehran, Iran

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