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Anodic Stripping Voltammetry in the Presence of Fumed Silica and Nonionic Surfactants

Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
In this paper we describe the stripping voltammetric method for the determination of metals in the presence of surfactants at the ppm level. The method employs fumed silica for selective adsorption of surfactants directly in the voltammetric cell. In the present work the suppressing effect of the surfactant is studied. The latter depends mainly on the kind of metal and on the parameters of the deposition stage. The fumed silica usually allows for the full restoration of the suppressed signal. In addition, it is possible to enhance the depolarizer signal in solution with silica suspension if high stirring rates are used during the deposition step. The method is validated by analyzing certified reference material and then tested with the natural sample.
Rocznik
Strony
1703--1717
Opis fizyczny
Bibliogr. 23 poz., rys.
Twórcy
autor
  • Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Kraków, Poland
autor
  • Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Kraków, Poland
autor
  • Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Kraków, Poland
autor
  • Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Kraków, Poland
Bibliografia
  • 1. „Introduction to Surfactant Analysis”, D.C. Cullum editor, Blackie Academic & Profesional, London 1994.
  • 2. Israelachvili J., in: Mittal K.L. and P. Bothorel eds. „Surfactants in Solutions”, Vol. 4, Plenum, New York 1986, p. 3.
  • 3. Mclntire G.L., CRC Crit. Rev. Anal. Chem. 21, 257 (1990).
  • 4. Meites L. and Meites T., J. Am. Chem. Soc., 73, 177 (1951).
  • 5. Schmid R.W. and Reilley C.N., J. Am. Chem. Soc., 80, 2087 (1958).
  • 6. Łukaszewski Z., Rozprawy Politechniki Poznańskiej, Nr. 87, Poznań 1978 (in Polish).
  • 7. Rupp E. and Zuman P., Anal. Lett., 27, 939 (1994).
  • 8. Bersier P.M. and Bersier J., Analyst., 113, 3 (1988).
  • 9. Lipkowski J. and Galus Z., in: “Adsorpcja na elektrodach i inhibitowanie reakcji elektrodowych”, ed. Z.Galus, PWN Warszawa 1980, pp. 37-57 (in Polish).
  • 10. Lipkowski J. and Galus Z., J. Electroanal. Chem., 61, 11 (1975).
  • 11. Bednarkiewicz E. and Kublik Z., Anal. Chim. Acta, 176, 133(1985).
  • 12. Saleh M.M. and Atica A.A., Adsorption Sci. & Techn., 17, 53 (1999).
  • 13. Bond A.M. and Reust J.B., Anal. Chim. Acta, 162, 389 (1984).
  • 14. Golimowski J. and Golimowska K., Anal. Chim. Acta, 325, 111 (1996).
  • 15. Kowalski Z., Kołder E. and Niewiara E., Euroanalysis V, Book of Abstracts, paper 1-46, Kraków 1984.
  • 16. Sosman R.S., „The Phases of Silica”, Rutgers University Press, New Brunswick NJ 1965.
  • 17. Kubiak W.W. and Kowalski Z., Talanta, 41, 1319 (1994).
  • 18. Kubiak W.W. and Kowalski Z., Anal. Chem,. 61, 1598 (1989).
  • 19. Kubiak W.W. and Wang J., Talanta, 36, 821 (1989).
  • 20. Kubiak W.W. and Wang J., J. Electroanal. Chem., 258, 41 (1989).
  • 21. Kubiak W.W. and Niewiara E., Electroanalysis, 14, 1169 (2002).
  • 22. Mironyuk I.F., Gun’ko V.M., Turov V.V., Zarko V.I., Leboda R. and Skubiszewska-Zięba J., Colloids and Surfaces A, 180, 87 (2001).
  • 23. Kosmulski M., Colloids and Surfaces A, 117, 201 (1996).
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BUJ1-0024-0108
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