XPS and AES analysis of PVD coatings

• Autorzy: Dobrzański L. , Żukowska L. , Kubacki J. , Gołombek K. , Mikuła J.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The X-Ray Photoelectron Spectrometry (XPS) and Auger Electrons Spectroscopy (AES) analysis of PVD coatings were performed for samples, made from cemented carbides, cermets and composite gradient tool materials. Design/methodology/approach: The Ti(C,N) gradient coating was investigated by XPS and AES method with multifunctional PHI 5700/660 spectrometer. The characteristic of surface region coating were determined from XPS depth profile. The transition region between Ti(C,N) coating and substrate was analyzed by AES method as line profile. Findings: The coating consists mainly of TiC and TiN compound. The oxygen impurities of investigated coating is below 2%. The "fresh" surface of Ti(C,N) coating is covered by thin films TiO₂. There was observed homogeneous distribution of carbon, titanium and nitrogen elements in the surface region. The ratio of C/N obtained for surface region is characteristic for deposited coating. The transition region is also homogeneous between coating and cermet substrate. Practical implications: PVD deposition techniques making it possible to obtain surface layers with the varying thickness values, respectively, with the structure changing across the layer depth along with the change of its chemical or phase compositions for improvement of its properties, and especially for the advantageous combination of the very high abrasion wear resistance of the surface along with the relatively high ductility of the core of materials used for, respectively, blanking tools and for hot working, profile cutting tools with ductility high enough and for the heavy duty very high speed cutting tools. Originality/value: Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) are an excellent tools for performing surface analysis and for determining elemental composition as a function of depth. AES or XPS analyzes the residual surface left after a certain sputtering time with rare gas ions. In this way composition depth profiles can be obtained that provide a powerful means for analyzing worked layers, modified layers, thin films, multiple-layered coatings, lubricants, reaction film products, transferred films, and their interfaces.

Słowa kluczowe

EN

spectroscopy; XPS; AES; PVD

PL

spektroskopia; XPS; AES; PVD

• Wydawca: International OCSCO World Press
• Czasopismo: Archives of Materials Science and Engineering
• Rocznik: 2008
• Tom: Vol. 32, nr 2
• Strony: 99--102
• Opis fizyczny: Bibliogr. 15 poz.

Twórcy

autor

Dobrzański L.

autor

Żukowska L.

autor

Kubacki J.

autor

Gołombek K.

autor

Mikuła J.

• Division of Materials Processing Technology, Management and Computer Techniques in Materials Science, Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland,

Bibliografia

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