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Abstrakty
Unprotected organic devices suffer from degradation due to water and oxygen incorporation. To validate the function of organic thin film transistor capsulation, interdigital transistor structures (WIL = 16 830 and WIL = 23 400) were prepared on p-type silicon wafers, and a high current was driven (initially up to -15 mA and -6.8 mA, respectively, at -40VDS, -40V GS) in order to detect their explicit reactions to degradation. Subsequently, the OTFT active layer was encapsulated with 1.5 urn of sputtered polytetrafluoroethylene (PTFE). The degradation experiment for 4 months in dark laboratory conditions revealed reduced degradation compared to earlier experiments using thinner protection films. During the experiment, the threshold voltage shifted in the positive direction, suggesting degradation only due to oxygen. Obviously, degradation due to humidity was blocked, as it would have caused a negative threshold voltage shift.
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Czasopismo
Rocznik
Tom
Strony
95--101
Opis fizyczny
Bibliogr. 10 poz.
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autor
autor
autor
autor
autor
autor
autor
autor
- University of Paderborn, Department EIM-E/Sensorik, Warburger str. 100, D-33098 Paderborn, pannemann@sensorik.uni-paderborn.de
Bibliografia
- [1] KLAUK H., HALIK M., ZSCHIESCHANG U., EDER F., SCHMID G., DEHM C., Appl. Phys. Lett., 82 (2003), 4175.
- [2] BAUDE P.F., ENDER D.A., HAASE M.A., KELLEY T.W., MUYRES D.V., THEISS S.D., Appl. Phys. Lett., 82 (2003), 3964.
- [3] EDER F., KLAUK H., HALIK M., ZSCHIESCHANG U., SCHMID G., DEHM C., Appl. Phys. Lett., 84 (2004), 2673.
- [4] SEKITANI T., KATO Y., IBA S., SHINAOKA H., SOMEYA T., SAKURAI T., TAKAGI S., Appl. Phys. Lett., 86 (2005), 073511.
- [5] NORTHRUP J.E., CHABINYC M.L., Phys. Rev. B, 68 (2003), 041202(R).
- [6] JURCHESCU O.D., BAAS J., PALSTRA T.T.M., Appl. Phys. Lett., 84 (2004), 3061.
- [7] PANNEMANN C., DIEKMANN T., HILLERINGMANN U., Proc. of the 16th International IEEE Conf. on Microelectronics ICM 2004, ISBN: 0-7803-8656-6, IEEE Catalog Number: 04EX918 (2004), p. 79.
- [8] PANNEMANN C., DIEKMANN T., HILLERINGMANN U., J. Mater. Res., 19 (2004), 1999.
- [9] LEE J.H., KIM G.H., KIM S.H., LIM S.C., YANG Y.S., YOUK J.H., KANG J., ZYUNG T., Synth. Metals, 143 (2004), 21.
- [10] SCHÜRMANN U., HARTUNG W.A., TAKELE H., ZAPOROJTCHENKO V., FAUPEL F., Nanotechnology, 16 (2005), 1078.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BPW8-0003-0011