Structural and optical properties of vanadium oxides prepared by microwave-assisted reactive magnetron sputtering

• Autorzy: Sieradzka K. , Wojcieszak D. , Kaczmarek D. , Domaradzki J. , Kiriakidis G. , Aperathitis E. , Kambilafka V. , Placido F. , Song S.
• Języki publikacji: EN

Abstrakty

EN

In this work, structural and optical properties of vanadium oxides have been presented. Thin films were manufactured by microwave-assisted magnetron sputtering process. Particles were sputtered from a vanadium target in Ar/O2 atmosphere. Oxygen partial pressure was changing from 3×10-4 to 7×10-4 Torr. After the deposition, the thin films were additionally annealed at 400 °C in ambient air in order to oxidize the films. Structural investigation was performed with the aid of X-ray diffraction measurements and Raman spectroscopy. The results obtained from both methods have revealed that as-deposited films were amorphous, while annealed films had V2O5 crystal form. Optical properties were determined by transmission measurements in the spectral range from 250 to 2500 nm. As-deposited films had low transmission (below 10%), but oxidization by additional annealing of the structure resulted in the increase of the transmission level up to about 20 and 43% at 650 nm wavelength for samples prepared under 3×10-4 and 7×10-4 Torr oxygen partial pressure, respectively. The analysis of the structure and optical properties of the thin films has revealed the influence of deposition parameters on the properties of vanadium oxides.

Słowa kluczowe

EN

vanadium oxide; sputtering; structural properties; optical properties; annealing

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2011
• Tom: Vol. 41, nr 2
• Strony: 463--469
• Opis fizyczny: Bibliogr. 17 poz.

Twórcy

autor

Sieradzka K.

autor

Wojcieszak D.

autor

Kaczmarek D.

autor

Domaradzki J.

autor

Kiriakidis G.

autor

Aperathitis E.

autor

Kambilafka V.

autor

Placido F.

autor

Song S.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland

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