Application of AFM technique for creation of patterns in nanoscale

• Autorzy: Ramiączek-Krasowska M. , Szyszka A. , Stafiniak A. , Paszkiewicz R. , Paszkiewicz B. , Tłaczała M.
• Języki publikacji: EN

Abstrakty

EN

The lithography is a main technology process which determines the properties of semiconductor devices. The resolution of optical lithography is insufficient for creation of submicrometer patterns, like, e.g., gate electrode in HEMT transistors. Thus, a novel technique that uses AFM technique and common photolithography was proposed. In the paper, the results of nanoscratching lithography were presented and discussed. Also the transmission and root mean square of thin metal films measurements were summarized.

Słowa kluczowe

EN

nanoscratching; nanoscribing; AFM lithography; lift-off technique

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2011
• Tom: Vol. 41, nr 2
• Strony: 307--314
• Opis fizyczny: Bibliogr. 13 poz.

Twórcy

autor

Ramiączek-Krasowska M.

autor

Szyszka A.

autor

Stafiniak A.

autor

Paszkiewicz R.

autor

Paszkiewicz B.

autor

Tłaczała M.

• Faculty of Microsystem Electronic and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland

Bibliografia

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