Structural, morphological and electrochemical characterization of electron beam deposited Li 1+xMn2O4 (x = 0, 0.05) thin films

• Autorzy: Balaji S. , Shanmugan S. , Mutharasu D. , Ramanathan K.
• Języki publikacji: EN

Abstrakty

EN

Li1+xMn2O4 (x = 0, 0.05) powders were synthesized using the microwave assisted co-precipitation method. Materials were evaporated using an electron beam gun. Structural analyses of thin films coated over platinum substrates revealed their cubic structure. The lattice constant of Li1.05Mn2O4 thin film was found to be around 8.2475 A. The lattice constant of Li1.05Mn2O4 Powder was found to be 8.2488 A. Morphological properties of the coated films were studied by SEM and the obtained micrographs were analyzed using the Image-j software. The roughness and the porosity were observed to be higher for the samples containing an excess of Li. The thin films were subjected to electrochemical characterization in aqueous LiNO3 solution; cyclic voltammograms obtained for the samples revealed two sets of well defined redox peaks around 0.07 and 0.1 V in LiNO3 solution. The redox peaks in Li1.05Mn2O4 thin film samples had lower intensities than those of the stochiometric compound.

Słowa kluczowe

EN

LiMn2O4; microwave synthesis; electron beam evaporation

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2010
• Tom: Vol. 28, No. 2
• Strony: 583--593
• Opis fizyczny: Bibliogr. 21 poz.

Twórcy

autor

Balaji S.

autor

Shanmugan S.

autor

Mutharasu D.

autor

Ramanathan K.

• Materials Laboratory Thiagarajar Advanced Research Centre Thiagarajar College of Engineering Madurai-625 015 Tamil Nadu India

Bibliografia

• [1] GADJOV H., GOROVA M., KOTZEVA V., AVDEEV G., UZUNOVA S., KOVACHEVA D., J. Power Sources,134 (2004), 110.
• [2] BATES J.B., DUDNEY N.J., GRUZALSKI G.R., ZUHR R.A., CHOUDHURY A., LUCK C.F., J. Power Sources, 43–44 (1993), 103.Characterization of electron beam deposited Li 1+xMn2O4 (x = 0, 0.05) thin films 593
• [3] ROUGIER A., STRIEBEL K.A., WEN S.J., CAIRNS E.J., J. Electrochem. Soc., 145 (1998), 2975.
• [4] FRAGNAUD P., NAGARAJAN R., SCHLEICH D.M., VUJIC D., J. Power Sources, 54 (1995), 362.
• [5] SHOKOOHI F.K., TARASCON J.M., WIKENS B.J., GUYOMARD D., CHANG C.C., J. Electrochem. Soc.,139 (1992), 1845.
• [6] HARISH BHAT M., CHAKRAVARTHY P., RAMAKRISHNAN A., LEVASSEUR., RAO K.J., Bull. Mater. Sci.,23 (2000), 461.
• [7] YEN PEI FU., YU HSIU SU., CHENG HSIUNG LIN., SHE HUANG WU., J. Mater. Sci., 41 (2006), 1157.
• [8] ALI EFTEKHARI., Electrochim. Acta, 47 (2001), 495.
• [9] SPOTZ S., SKAMSER D.J., JOHNSON D.L., J. Am. Ceram. Soc., 78 (1995), 1041.
• [10] RAMESH P.D., BRANDON D., SCHACHTER L., Mat. Sci. Eng., A266 (1999), 211.
• [11] LI W., DAHN J.R., WAINWRIGHT D.S., Science, 264 (1994), 1115.
• [12] ARORA P., POPOV B.N., WHITE R.E., J. Electrochem Soc., 145 (1998), 807.
• [13] OHZUKU T., KITAGAWA M., HIRAI T., J. Electrochem. Soc., 137 (1990), 769.
• [14] LALITHA S., SATHYAMOORTHY R., SENTHILARASU S., SUBBARAYAN A., NATARAJAN K., Sol. En. Mater.Sol. Cells, 82 (2004), 187.
• [15] CHUNG K.Y., KIM K.B., Electrochim. Acta, 49 (2004), 3327.
• [16] Research Services Branch NIMH & NINDS Image J., Image processing and analysis in Java Available via Web site: http://rsb.info.nih.gov/ij.
• [17] SIMMEN F., LIPPERT T., NOVÁK P., NEUENSCHWANDER B., DÖBELI M., MALLEPELL M., WOKAUN A.,Appl. Phys. A, 93 (2008), 711.
• [18] LI W., MCKINNON W.R., DAHN J.R., J. Electrochem. Soc., 141 (1994), 2310.
• [19] GUMMOW R.J., DE KOCK A., THACKERAY M.M., Solid State Ionics, 69 (1994), 59.
• [20] WANG PEI, YANG HU, YANG HUAQUAN, J. Power Sources, 63 (1996), 275.
• [21] JAYALAKSHMI M., MOHAN RAO M., SCHOLZ F., Langmuir, 19 (2003), 8403.