Real-time mask-division technique based on DMD digital lithography

• Autorzy: Luo N. , Gao Y. , Chen M. , Yu L. , Ye Q.
• Języki publikacji: EN

Abstrakty

EN

Digital lithography technique is a promising tool for the fabrication of binary optical element. In this paper, we present the mask-division technique to improve the lithography quality. A piece of high-frequency mask is divided into several pieces of low-frequency binary masks. Then they are imaged on the photoresist successively by using the DMD-based lithography system. Based on the theory of partial coherent light, the intensity distribution in image plane has been simulated. The grating masks with period of 4 žm have been fabricated by using the mask-division technique. Experimental results demonstrate the feasibility of the proposed method as an effective technique for advancing the edge sharpness.

Słowa kluczowe

EN

digital lithography technique; mask-division technique; edge sharpness

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2010
• Tom: Vol. 40, nr 1
• Strony: 239--248
• Opis fizyczny: Bibliogr. 11 poz.

Twórcy

autor

Luo N.

autor

Gao Y.

autor

Chen M.

autor

Yu L.

autor

Ye Q.

• College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, P.R. China

Bibliografia

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