Amorphous phase formation of Zr-Cu thin films fabricated by magnetron co-sputtering

• Autorzy: Li L. X. , Zhang D. T. , Li M. , Wang H. X.
• Języki publikacji: EN

Abstrakty

EN

ZrxCu1-x amorphous films were prepared on Si(111) substrates by magnetron co-sputtering of pure Zr and Cu targets. It was found that the amorphous forming ability of the films increased with x when x was smaller than 65. It was therefore different from their bulk counterparts, which only for x = 35 and 50 were reported to have high glass forming ability during casting. The structures of the films were sensitive to the substrate temperature and the sputtering pressure of argon. X-ray diffraction and atomic force microscopic analyses of the Zr65Cu35 amorphous films annealed at various temperatures confirmed that the crystallization temperature was approximately 573 K.

Słowa kluczowe

EN

Zr-Cu thin film; magnetron sputtering; amorphous film; crystallization

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2009
• Tom: Vol. 27, No. 2
• Strony: 539--545
• Opis fizyczny: Bibliogr. 22 poz.

Twórcy

autor

Li L. X.

autor

Zhang D. T.

autor

Li M.

autor

Wang H. X.

• College of Physics and Chemistry, Henan Polytechnic University, Jiaozuo, 454000 China

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