The study of the good polishing method for polymer SU-8 waveguide

• Autorzy: Ab-Rahman M. S. , Ab-Aziz F. , Azura N. A. , Arif M. , Zan S. D. , Mustaza S. M. , Ehsan A. A. , Shaari S.
• Języki publikacji: EN

Abstrakty

EN

This research focused on polish characteristic of polymer based waveguides. The aim of the research was to show how polishing parameters affect the cut length of the end surface of SU-8 polymer on silicon and to detemine the best parameters for polishing SU-8 polymer. Then, four samples were used for characterizing the polishing of polymer. Each sample was polished with the same rotation and sandpaper size but with different rotational speed. The experiment result shows that the best rotational speed for polishing polymer SU-8 sample on silicon is 200 rpm.

Słowa kluczowe

EN

waveguides polishing; SU-8 polymer; rotational speed; sandpaper; silicon; cut off length

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2009
• Tom: Vol. 39, nr 3
• Strony: 459--465
• Opis fizyczny: bibliogr. 18 poz.,

Twórcy

autor

Ab-Rahman M. S.

autor

Ab-Aziz F.

autor

Azura N. A.

autor

Arif M.

autor

Zan S. D.

autor

Mustaza S. M.

autor

Ehsan A. A.

autor

Shaari S.

• Department of Electrical, Electronic & System Engineering, Faculty of Engineering & Build Environment, Universiti Kebangsaan Malaysia, 43600 UKM Bangi, Selangor

Bibliografia

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