Investigations of electrical properties of Eu- and Pd-doped titanium dioxide thin films on silicon

• Autorzy: Domaradzki J. , Borkowska A. , Kaczmarek D. , Prociow E. L.
• Języki publikacji: EN

Abstrakty

EN

In this work, investigations of electrical properties of Eu- and Pd-doped TiO2 thin films have been outlined. Thin films were deposited by low pressure hot target reactive magnetron sputtering from metallic Ti-Eu-Pd mosaic target on conventional silicon wafers. For electrical characterization of prepared thin films both temperature dependent resistivity and current to voltage (I-V) characteristics have been examined. It has been shown that incorporation of Pd and Eu dopants into TiO2 matrix modified its properties to obtain n-type oxide-semiconductor which is electrically and optically active at room temperature. Additionally from I-V measurements the formation of heterojunction at the interface of thin film-silicon was confirmed.

Słowa kluczowe

EN

oxide semiconductor; thin film; electrical properties

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2007
• Tom: Vol. 37, nr 1-2
• Strony: 133--137
• Opis fizyczny: Bibliogr. 11 poz.,

Twórcy

autor

Domaradzki J.

autor

Borkowska A.

autor

Kaczmarek D.

autor

Prociow E. L.

• Wroclaw University of Technology, Wyb. Wyspianskiego 27, 50-370 Wroclaw, Poland

Bibliografia

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• [5] Domaradzki J., Borkowska A., Kaczmarek D., Proci6w E., Transparent oxide semiconductors based on Ti02 doped with V, Co and Pd elements, Journal of Non-Crystalline Solids 352(23-25), 2006, pp. 2324-7.
• [6] Prociow E., Domaradzki J., Kaczmarek D., Investigations of structural and electronic properties of Ti02-doped layers deposited by hot target reactive magnetron sputtering method, IV International Conference on Advanced Semiconductor Devices and Microsystems, ASDAM'02, Slovakia, IEEE 02EX531, 2002, pp. 51-4.
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• [8] Kudrawiec R., Podhorodecki A., Mirowska N., Misiewicz J., Molchan I.S., Gaponenko N.V., Lutich A.A., Gaponenko S.V., Photoluminescence investigation of europium-doped alumina, titania and indium sol-gel derivedfilms in porous anodic alumina, Material Science and Engineering B 105(1-3), 2003, pp. 53-6.
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• [10] Domaradzki J., Kaczmarek D., Prociow E.L., Borkowska A., Kudrawiec R., Misiewicz J., Schmeisser D., Beuckert G., Characterization of nanocrystalline Ti02 - Hf02 thin films prepared by low pressure hot target reactive magnetron sputtering, Surface and Coatings Technology 200(22-23), 2006, pp. 6283-7.
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