Energy meter system for gas-puff laser plasma

• Autorzy: Bielecki Z. , Mikołajczyk J.
• Języki publikacji: EN

Abstrakty

EN

The authors demonstrate a detection system of EUV radiation pulses. The system provides energy measurements with uncertainty of 7.3% in the range of wavelengths 13.5 ą 0.5 nm (FWHM = 7.3%). The calibration of the system was taken using the E-Mon commercial meter and a laser-plasma source. The procedures made it possible to determine a calibration factor for the laser-plasma source with helium-xenon gas puff target. The factor is exploited for the purpose of standardizing measurements of EUV radiation with FWHM = 2%. A substantial improvement in the system responsivity is demonstrated.

Słowa kluczowe

EN

EUV radiation; EUV energy meter; nanolithography

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2007
• Tom: Vol. 37, nr 1-2
• Strony: 83--92
• Opis fizyczny: Bibliogr. 7 poz.,

Twórcy

autor

Bielecki Z.

autor

Mikołajczyk J.

• Institute of Optoelectronocs, Military University of Technology, Kaliskiego 2, 00-908 Waesaw, Poland

Bibliografia

• [1] Missalla T., Schurmann M.C., Lebert R., Wies C, Juschkin L., Klein R., Scholze F., Ulm G., Egbert A., Tkachenko B., Chichkov B., Metrology tools for EUV-source characterization and optimization, Proceedings of SPIE 5374, 2004, pp. 979-90.
• [2] Bijkerk F., Stuik R., Bruineman C, EUVL Source Workshop, ISMT, Santa Clara 2002.
• [3] Cross-Calibration of Extreme Ultraviolet (EUV) Energy Sensors, International SEMATECH Technology Transfer #04024498A-TR, http://www.seinatech.org/docubase/documenty4498atr.pdf.
• [4] http://www.iof.fhg.de/departments/optical-coatings/vuv-euv-xray/projects/euv_schmalband_e.html.
• [5] Fiedorowicz H., Bartnik A., Szczurek. M., Daido H., Sakaya N., Kmetikl V., Kato Y., Suzuki M., Matsumura M., Tajima J., Nakayama T, Wilhein T, Investigation of soft X-ray emission from a gas puff target irradiated with a Nd:YAG laser, Optics Communications 163(1-3), 1999, pp. 103-14.
• [6] Feigl T, Yulin S., Benoit N., Kaiser N., EUV multilayer optics, Microelectronic Engineering 83(4-9), 2006, pp. 703-6.
• [7] http://www.ird-inc.com.