Preparation and properties of colloidal nanosize silica dioxide for polishing of monocrystalline silicon wafers

• Autorzy: Gaishun V. E. , Tulenkova O. I. , Melnichenko I. M. , Baryshnin S. A. , Potapenok Y. A. , Xlebokazov A. P. , Stręk W.
• Konferencja: International Conference on Sol-Gel materials SGM 2001, Rokosowo, Poland
• Języki publikacji: EN

Abstrakty

EN

Colloidal silica can be used for final general metallographic polishing. It is used to polish single crystal silicon for electronic applications and, subsequently, polycrystalline silicon for solar cells, gallium arsenide, indium phosphide, titanium, gadolinium gallium garnet and sapphire. The silica dioxide are dispersed in water with alkaline compound added to obtain the desired pH.

Słowa kluczowe

EN

colloidal silica; metallographic polishing; silicon

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Materials Science
• Rocznik: 2002
• Tom: Vol. 20, No. 2
• Strony: 19--22
• Opis fizyczny: Bibliogr. 4 poz..

Twórcy

autor

Gaishun V. E.

• AMRL, F. Skorina Gomel State University, Gomel, Belarus

autor

Tulenkova O. I.

• AMRL, F. Skorina Gomel State University, Gomel, Belarus

autor

Melnichenko I. M.

• AMRL, F. Skorina Gomel State University, Gomel, Belarus

autor

Baryshnin S. A.

• AMRL, F. Skorina Gomel State University, Gomel, Belarus

autor

Potapenok Y. A.

• AMRL, F. Skorina Gomel State University, Gomel, Belarus

autor

Xlebokazov A. P.

• AMRL, F. Skorina Gomel State University, Gomel, Belarus

autor

Stręk W.

• Institute of Low Temperature and Structure Research, Polish Academy of Sciences, 2 Okólna St., 50-950 Wrocław, Poland

Bibliografia

• [1] PAYNE C.C., U.S. Patent 4, 169,337, Process for Polishing Semi-Conductor Materials, October 2, 1979.
• [2] YANCEY P.G., U.S. Patent 4, 242, 842, Precision Polishing Suspension and Metod for Making Same, January 6, 1981.
• [3] PAYNE C.C., U.S. Patent 4, 558, 421, Aqueous Silica Compositions for Polishing Silicon Wafers, Silica Gel or Sol and Priperazine Compound, May 13, 1986.
• [4] ILER R.K., The chemistry of silica, Moscow, “Mir”, p. II, 1982, p. 135