Thermal characterization of copper thin films made by means of sputtering

• Autorzy: Szeloch R. F. , Posadkowski W. M. , Gotszalk T. P. , Janus P. , Kowaliw T.
• Języki publikacji: EN

Abstrakty

EN

Copper thin films have been deposited onto Corning glass substrates by means of two kinds of DC magnetron sputtering. The goal of this research was to study differences in thermal characteristics of both kinds of the films. The differences between these layers originate from the technological processes; one of them employs an inert gas -- argon -- in the vacuum chamber, and the other is the so-called "pure" self-sputtering. Thermal characterization of the layers was performed using the scanning thermal microscopy (SThM) as well as a far field thermographical system.

Słowa kluczowe

EN

copper; magnetron; sputtering; scanning thermal microscopy

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Materials Science
• Rocznik: 2003
• Tom: Vol. 21, No. 3
• Strony: 339--343
• Opis fizyczny: Bibliogr.17 poz.

Twórcy

autor

Szeloch R. F.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

autor

Posadkowski W. M.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

autor

Gotszalk T. P.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

autor

Janus P.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

autor

Kowaliw T.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

Bibliografia

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