The effect of film thickness on physical properties of fluorine-doped indium oxide thin films

• Autorzy: Rozati S. M. , Ganj T.
• Języki publikacji: EN

Abstrakty

EN

In this paper, fluorine-doped indium oxide films of thicknesses ranging from 115 nm to 1290 nm were prepared using the spray pyrolysis technique by varying the amount of spray solution and keeping constant the substrate temperature, doping concentration and air flow rate. The preferential growth orientation was determined using the X-ray diffraction (XRD) spectra of doped indium oxide films of various thicknesses. The sheet resistance decreases gradually with the film thickness and reaches a stable value. It has also been observed that an increase in thickness deteriorates the optical properties of the deposited films beyond some limit.

Słowa kluczowe

EN

In2O3:F; transparent conductive oxide; spray pyrolysis

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2004
• Tom: Vol. 22, No. 2
• Strony: 93--97
• Opis fizyczny: Bibliogr. 15 poz.

Twórcy

autor

Rozati S. M.

• Physics Department, University of Guilan, Rasht 41335, Iran

autor

Ganj T.

• Physics Department, University of Guilan, Rasht 41335, Iran

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