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Uncertainty of atomic force microscopy measurements

Wybrane pełne teksty z tego czasopisma
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Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
We consider the problem of uncertainty in geometrically linear measurements in scanning probe microscopy (SPM) represented by atomic force microscopy (AFM). The uncertainties under consideration are associated both with quantum phenomena in the space cantilever tip--sample surfaces and with effects of dynamic behavior of electronic and optic measurement and control systems. In our experiment, we have analyzed uncertainty of calibrated atomic force microscopy (C-AFM) measurement in two dimensions. Uncertainty of measurements has been estimated according to GUM procedure.
Czasopismo
Rocznik
Strony
397--403
Opis fizyczny
Bibliogr. 22 poz.
Twórcy
autor
autor
  • Faculty of Microsystem Electronics and Fotonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland
Bibliografia
  • [1] THINH VAN TRAN (DANGSON), The resolution limits of space and time,http://www.thinhtran.com/resolution_limit.html, (2002).
  • [2] THINH VAN TRAN (DANGSON), The resolution limit interpretation of the Heisenberg uncertainty principle, http://www.thinhtran.com/heisenberg.html, (2002).
  • [3] THINH VAN TRAN (DANGSON), The space-time foundation of quantum physics,http://www.thinhtran.com/quantum_physics.html, (2002).
  • [4] MENSKY M.B., Classical and quantum chaos from continuous quantum measurements, Chaos, Solitons and Fractals 5(7), 1995, pp. 1381–7.
  • [5] TAYLOR B.N., KUYATT C.E., Guidelines for evaluating and expressing the uncertainty of NIST measurement results, NIST Technical Note 1297 (1994 Edition).
  • [6] Guide to the Expression of Uncertainty in Measurement, BIPM, IEC, IFCC, ISO, IUPAC, IUPAP, OIML, 1st Edition 1993 (corrected 1995).
  • [7] International Vocabulary of Basic and General Terms in Metrology, BIPM, IEC, IFCC, ISO, IUPAC, IUPAP, OIML, 2nd Edition, 1993.
  • [8] WANG C.M., IYER H.K., A generalized confidence interval for a measurand in the presence of type-A and type-B uncertainties, Measurement 39(9), 2006, pp. 856–63.
  • [9] ARRI E., CABIATI F., D’EMILIO S., GONELLA L., On the application of the guide to the expression of uncertainty in measurement to measuring instruments, Measurement 16(1), 1995, pp. 51–7.
  • [10] MAURIS G., LASSERRE V., FOULLOY L., A fuzzy approach to the expression of uncertainty in measurement, Measurement 29(3), 2001, pp. 165–77.
  • [11] FRASE C.G., BUHR E., DIRSCHERL K., CD characterization of nanostructures in SEM metrology, Measurement Science and Technology 18(2), 2007, pp. 510–9.
  • [12] AKETAGAWA M., IKEDA Y., TANYARAT N., ISHIGE M., Optical encoder calibration using lattice spacing and optical fringe derived from a scanning tunnelling microscope and optical interferometer, Measurement Science and Technology 18(2), 2007, pp. 503–9.
  • [13] HAYCOCKS J., JACKSON K., Traceable calibration of transfer standards for scanning probe microscopy, Precision Engineering 29(2), 2005, pp. 168–75.
  • [14] ORJI N.G., DIXSON R.G., Higher order tip effects in traceable CD-AFM-based linewidth measurements, Measurement Science and Technology 18(2), 2007, pp. 448–55.
  • [15] MARINELLO F., BARIANI P., DE CHIFFRE L., SAVIO E., Fast technique for AFM vertical drift compensation, Measurement Science and Technology 18(3), 2007, pp. 689–96.
  • [16] MARENDZIAK A., Application of the scanning probe microscopy in measurements of geometrical dimentions of nanostructures, Thesis, Wrocław University of Technology, Poland 2005 (in Polish).
  • [17] GONDA N., DOI T., KUROSAWA T., TANIMURA Y., HISATA N., YAMAGISHI T., FUJIMOTO H., YUKAWA H., Real-time, interferometrically measuring atomic force microscope for direct calibration of standards, Review of Scientific Instruments 70(8), 1999, pp. 3362–8.
  • [18] MISUMI I., GONDA S., KUROSAWA T., TANIMURA Y., OCHIAI N., KITTA J., KUBOTA F., YAMADA M., FUJIWARA Y., NAKAJAMA Y., TAKAMASU K., Comparing measurements of 1D-grating samples using optical diffraction technique, CD-SEM and nanometrological AFM, Proceedings of the 3rd EUSPEN International Conference, Eindhoven, The Netherlands, May 26–30, Vol. 2, 2002, pp. 517–20.
  • [19] MISUMI I., GONDA S., KUROSAWA T., TAKAMASU K., Uncertainty in pitch measurements of one-dimensional grating standards using a nanometrological atomic force microscope, Measurement Science and Technology 14(4), 2003, pp. 463–71.
  • [20] BIENIAS M., GAO S., HASCHE K., SEEMANN R., THIELE K., A metrological scanning force microscope used for coating thickness and other topographical measurements, Applied Physics A: Materials Science Processing 66, 1998, pp. S837–42.
  • [21] MELI F., THALMANN R., Long-range AFM profiler used for accurate pitch measurements, Measurement Science and Technology 9(7), 1998, pp. 1087–92.
  • [22] GARNAES J., KOFOD N., KÜHLE A., NIELSEN C., DIRSCHERL K., BLUNT L., Calibration of step heights and roughness measurements with atomic force microscopes, Precision Engineering 27(1), 2003, pp. 91–8.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BPW6-0011-0008
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