The study of structural and optical properties of TiO2:Tb thin films

• Autorzy: Borkowska A. , Domaradzki J. , Kaczmarek D. , Wojcieszak D.
• Języki publikacji: EN

Abstrakty

EN

This work presents the study of the structural and optical properties of TiO₂:Tb thin films deposited on Si (100) and SiO₂ substrates by magnetron sputtering from metallic Ti-Tb mosaic target. Thin films were studied by means of scanning electron microscopy with energy disperse spectrometer (SEM-EDS), atomic force microscopy (AFM), X-ray diffraction (XRD) and the optical transmission method. From SEM-EDS the total amount of Tb concentration was determined. XRD analysis revealed the existence of crystalline TiO₂ in the form of anatase and rutile, depending on Tb amount in the examined samples. The optical transmission method has shown that Tb doping shifts the fundamental absorption edge of TiO₂ toward the longer wavelength region.

Słowa kluczowe

EN

terbium; TiO2; thin films; magnetron sputtering

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2007
• Tom: Vol. 37, nr 4
• Strony: 335--340
• Opis fizyczny: Bibliogr. 14 poz.

Twórcy

autor

Borkowska A.

autor

Domaradzki J.

autor

Kaczmarek D.

autor

Wojcieszak D.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland

Bibliografia

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