Roughness of amorphous Zn-P thin films

• Autorzy: Jarząbek B. , Jurusik J. , Cisowski J. , Nowak M.
• Języki publikacji: EN

Abstrakty

EN

The effect of thickness variation and the surface roughness of amorphous Zn/sub 32/P/sub 68/ thin films has been investigated by the interference spectroscopy of the optical transmittance and reflectance, as well as by the atomic force microscopy (AFM). The analysis of the optical data allowed determination of the standard deviation of the thin film thickness by taking into account the Gaussian distribution of the change in phase of radiation traversing a thin film. It appears that the value of the standard deviation of the film thickness determined from the optical interference spectroscopy ( sigma /sub w/ approximately=26 nm) is comparable with the value of the mean surface roughness (R/sub a/ approximately=19 nm) evaluated from the AFM studies.

Słowa kluczowe

EN

amorphous state; atomic force microscopy (AFM); AMF; Gaussian distribution; infrared spectra; light interference; optical films; reflectivity; thin films; zinc compounds

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2001
• Tom: Vol. 31, nr 1
• Strony: 93--101
• Opis fizyczny: bibliogr. 20 poz.

Twórcy

autor

Jarząbek B.

autor

Jurusik J.

autor

Cisowski J.

autor

Nowak M.

• Polska Akademia Nauk, Centrum Chemii Polimerów, skr. poczt.20, 41-819 Zabrze, ul. M. Curie-Skłodowskiej 34 Title