Thermal characterization of micro-devices with far and near field microscopy

• Autorzy: Szeloch R. , Gotszalk T. , Janus P.
• Języki publikacji: EN

Abstrakty

EN

After a brief survey of several applications of scanning thermal microscopy (SThM) developed for high resolution thermal diagnostics we present results of thermal analysis of two types of MEMS. Firstly, we have applied our far field thermographic system for analysis of thermal behaviour of the silicon cantilever fabricated as a sensor for a femtocalorimeter near field system. The next results are linked with application of SThM system with the Wollaston probe in micro-thermal measurements of atomic force microscopy (AFM) cantilever

Słowa kluczowe

EN

scanning thermal microscopy; thermal characterization; AFM

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2003
• Tom: Vol. 33, nr 4
• Strony: 669--676
• Opis fizyczny: Bibliogr. 26 poz., rys.

Twórcy

autor

Szeloch R.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

autor

Gotszalk T.

• Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland

autor

Janus P.

• Institute of Electron Technology, al. Lotników 32/46, 02-668 Warszawa, Poland

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