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The metalorganic vapour phase epitaxy (MOVPE) technology requires precise control of growth process. Systems designed and built in our laboratory are equipped with two microcontroller-based device. The first one is used for driving pneumatic valves, mass flow controllers and pressure controllers, the second one is responsible for PID control of epitaxial reactor temperature. This paper describes the software designed to supervise both of these devices in order to make using of MOVPE system more efficient and less error-prone, as well as to provide help in emergency situations
Słowa kluczowe
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Tom
Strony
417--420
Opis fizyczny
bibliogr. 2 poz.
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autor
autor
autor
- The Faculty of Microsystem Electronics and Photonic, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50-372 Wrocław
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Bibliografia
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bwmeta1.element.baztech-article-BPW1-0013-0064