Optical properties of AlN thin films obtained by reactive magnetron sputtering

• Autorzy: Brudnik A. , Czapla A. , Kusior E.
• Języki publikacji: EN

Abstrakty

EN

Aluminium nitride films were deposited by reactive magnetron sputtering in an argon-nitrogen atmosphere. The process was controlled by the optical emission spectroscopy using the intensity of an aluminium emission line as an input signal for a nitrogen flow controller. The influence of the substrate temperature and the target sputtering rate on the structure and optical properties of AlN films were investigated.

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2002
• Tom: Vol. 32, nr 3
• Strony: 327--331
• Opis fizyczny: bibliogr. 5 poz.

Twórcy

autor

Brudnik A.

autor

Czapla A.

autor

Kusior E.

• Electronic Department, University of Mining and Metallurgy, al.Mickiewicza 30, 30-059 Kraków