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Cold plasma in the nanotechnology of catalysts

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Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
In the paper the preparation of catalysts with the use of cold plasmas is discussed. A special attention is focused on nanocatalysts. In general, there are three main trends in this field: (1) plasma enhanced preparation of ..classical" catalysts, (2) plasma sputtering of catalytically active compounds, especially metal and metal oxide nanoparticles, and (3) plasma-enhanced metal-organic chemical vapor deposition (PEMOCVD) of very thin metal and metal oxide films with specific nanostructure. It is shown that the cold plasma techniques are very effective methods for designing the nanocatalysts with distinct and tunable chemical activity, specificity and selectivity. Finally, our preliminary investigations concerning CoOx catalytic films fabricated by the PEMOCVD method are presented.
Rocznik
Strony
36--42
Opis fizyczny
Bibliogr. 38 poz., rys., tab.
Twórcy
autor
  • Technical University of Lodz, Faculty of Process and Environmental Engineering, 90-924 Lodz, Wolczanska 213
Bibliografia
  • 1. Hollahan J. R., Bell A. T.: Techniques and Applications of Plasma Chemistry, Wiley, New York, 1974.
  • 2. Burch J. L., et al., (Eds.), Plasma Physics of the Local Cosmos, The National Academies Press, Washington, D.C., 2004.
  • 3. Konuma M.: Film Deposition by Plasma Techniques, Springer, Berlin, 1992.
  • 4. Grill A.: Cold Plasma in Materials Fabrication, IEEE Press, New York, 1994.
  • 5. Bhushan B.: (Ed.), Handbook of Nanotechnology, Springer, Berlin, 2004.
  • 6. Heiz U., Landman U.: (Eds.), Nanocatalysis, Springer, Berlin, 2006.
  • 7. Kizling M. B., Jaras S.G.: A review of the use of plasma techniques in catalyst preparation and catalytic reactions, Appl. Cat. A: General, 1996, 147, 1.
  • 8. Liu C. -J., Vissokov G. P., Jang B. W. -L.: Catalyst preparation using plasma technologies, Catal. Today, 2002, 72, 173.
  • 9. Zhang Y., Chu W., Cao W., Luo C., Wen X., Zhou K.: A plasma-activated Ni/α-Al2O3 catalyst for the conversion of CH4 to syngas, Plasma Chem. Plasma Processing, 2000, 20, 137.
  • 10. Chen M. H., Chu W., Dai X. Y., Zhang X. W.: New palladium catalysts prepared by glow discharge plasma for the selective hydrogenation of acetylene, Catal. Today, 2004, 89, 201.
  • 11. Liu C. -J., Yu K., Zhang Y. -P., Zhua X., Hea F., Eliasson B.: Characterization of plasma treated Pd/HZSM-5 catalyst for methane combustion, Appl. Cat. B: Environmental, 2004, 47, 95.
  • 12. Zhu X., Yu K., Li J., Zhang Y. -P., Xia Q., Liu C. -J.: Thermogravimetric analysis of coke formation on plasmatreated Mo-Fe/HZSM-5 catalyst during nonoxidative aromatization of methane, React. Kinet. Catal. Lett., 2006, 87, 93.
  • 13. Legrand J. -C., Diamy A. -M., Riahi G., Randriamanantenasoa Z., Polisset-Thfoin M., Fraissard J., Application of a dihydrogen afterglow to the preparation of zeolite-supported metallic nanoparticles, Catal. Today, 2004, 89, 177.
  • 14. Li Z. -H., Tian S. -X., Wang H. -T., Tian H. -B.: Plasma treatment of Ni catalyst via a corona discharge, J. Molec. Catal. A: Chemical, 2004, 211, 149.
  • 15. Zhu Y. -R., Li Z. -H., Zhou Y. -H., Lv J., Wang H. -T.: Plasma treatment of Ni and Pt catalysts for partial oxidation of methane, React. Kinet. Catal. Lett., 2006, 87, 33.
  • 16. Gao J. S., Umeda K., Uchino K., Nakashima H., Muraoka K.: Control of sizes and densities of nano catalysts for nanotube synthesis by plasma breaking method, Mater. Sci. Eng. B, 2004, 107, 113.
  • 17. Gao J. S., Umeda K., Uchino K., Nakashima H., Muraoka K.: Plasma breaking of thin films into nano-sized catalysts for carbon nanotube synthesis, Mater. Sci. Eng. A, 2003, 352, 308.
  • 18. Rossnagel S. M., Cuomo J. J., Westwood W. D.: (Ed.), Handbook of Plasma Processing Technology; Fundamentals, Etching, Deposition, and Surface Interactions, Noyes Publ., Park Ridge, New Jersey, USA, 1990.
  • 19. Thomann A. L., Rozenbaum J. P., Brault P., Andreazza C., Andreazza P., Rousseau B., Estrade-Szwarckopf H., Berthet A., Bertolini J. C., Aires F. J. C. S., Monnet F., Mirodatos C., Charles C., Boswell R.: Plasma synthesis of catalytic thin films, Pure Appl. Chem., 2002, 74, 471.
  • 20. Thomann A. L., Rozenbaum J. P., Brault P., Andreazza-Vignolle C., Andreazza P.: Pd nanoclusters grown by plasma sputtering deposition on amorphous substrates, Appl. Surf. Sci., 2000, 158, 172.
  • 21. Berthet A., Thomann A. L., Aires F. J. C. S., Brun M., Deranlot C., Bertolini J. C., Rozenbaum J. P., Brault P., Andreazza P.: Comparison of Pd/(bulk SiC) catalysts prepared by atomic beam deposition and plasma sputtering deposition: characterization and catalytic properties, J. Catal., 2000, 190, 49.
  • 22. Brault P., Caillard A., Thomann A. L., Mathias J., Charles C., Boswell R. W., Escribano S., Durand J., Sauvage T.: Plasma sputtering deposition of platinum into porous fuel cell electrodes, J. Phys. D: Appl. Phys., 2004, 37, 3419.
  • 23. Narayanan S. R.: Development of advanced catalysts for direct methanol fuel cells, in Chalk, S.G. (Ed.), Progress Report for Hydrogen, Fuel Cells, and Infrastructure Technologies Program, U.S. Department of Energy, Washington, D.C., 2002.
  • 24. Tyczkowski J.: Electrical and optical properties of plasma polymers, in Biederman, H. (Ed.), Plasma Polymer Films, Imperial College Press, London, 2004.
  • 25. Feurer E., Suhr H.: Thin palladium films prepared by metal-organic plasma-enhanced chemical vapour deposition, Thin Solid Films, 1988, 157, 81.
  • 26. Etspüler A., Suhr H.: Deposition of thin rhodium films by plasma-enhanced chemical vapor deposition, Appl. Phys. A, 1989, 48, 373.
  • 27. Feurer E., Kraus S., Suhr H.: Plasma chemical vapor deposition of thin platinum films, J. Vac. Sci. Technol. A, 1989, 7, 2799.
  • 28. Dhar R., Pedrow P. D., Liddell K. C., Ming Q., Moeller T. M., Osman M. A.: Plasma-enhanced metal-or-ganic chemical vapor deposition (PEMOCVD) of catalytic coatings for fuel cell reformers, IEEE Trans. Plasma Sci., 2005, 33, 138.
  • 29. Dittmar A., Kosslick H., Müller J. P., Pohl M. M.: Characterization of cobalt oxide supported on titania prepared by microwave plasma enhanced chemical vapor deposition, Surf. Coat. Technol., 2004, 182, 35.
  • 30. Hamelmann F., Brechling A., Aschentrup A., Heinzmann U., Jutzi P., Sandrock J., Siemeling U., Ivanova T., Szekeres A., Gesheva K.: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition, Thin Solid Films, 2004, 446, 167.
  • 31. Karches M., Morstein M., Rohr P. R. v., Pozzo R. L., Giombi J. L., Baltanás M. A.: Plasma-CVD-coated glass beads as photocatalyst for water decontamination, Catal. Today, 2002, 72, 267.
  • 32. Koyano G., Watanabe H., Okuhara T., Misono M.: Structure and catalysis of cobalt oxide overlayers prepared on zirconia by low-temperature-plasma oxidation, J. Chem. Soc., Faraday Trans., 1996, 92, 3425.
  • 33. Kołodziej A., Łojewska J., Tyczkowski J., Kapica R., Żak J.: Nanostructured oxide catalysts for VOC combustion on microstructured catalytic reactor, in preparation to Catal. Today.
  • 34. Hadjiev V. G., Iliev M. N., Vergilov I. V.: The Raman spectra of Co3O4, J. Phys. C, 1988, 21, L199.
  • 35. Xiao T. -C., Ji S. -F., Wang H. -T., Coleman K. S., Green M. L. H.: Methane combustion over supported cobalt catalysts, J. Molec. Catal. A: Chemical, 2001, 175, 111.
  • 36. Zwinkels M. M., Jaras S. G., Menon P. G., Griffin T. A.: Catalytic materials for high-temperature combustion, Catal. Rev. Sci. Eng., 1993, 35, 319.
  • 37. Kazimierski P., Tyczkowski J., Hatanaka Y., Aoki T.: Transition from amorphous semiconductor to amorphous insulator in hydrogenated carbon-germanium films investigated by Raman spectroscopy, Chem. Mater., 2002, 14, 4694.
  • 38. Pedrow P. D., Dhar R., Moeller T. M., Ming Q., Liddell K. C., Osman M. A.: Synthesis of platinum-loaded zirconia on FecralloyR using composite plasma-polymerization films, 31st IEEE International Conference on Plasma Science, Baltimore (USA), IEEE, Piscataway, NJ, USA, 2004, p.171.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BPS2-0044-0023
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