Cylindric electromagnetron electrode for continuously variable PVD/CVD mixed processing

• Autorzy: Olcaytug F. , Szymanowski H. , Kaczmarek M. , Sobczyk A. , Rapiejko C. , Schalko J. , Piplits K. , Gazicki-Lipman M. , Yasuda H.
• Języki publikacji: EN

Abstrakty

EN

A construction of a cylindrical electromagnetron electrode, designed for its use in combined PVD/CVD processing, is presented. It consists of seven sections, forming a sequence of seven separate electromagnets, oriented in a NS-SN-NS-SN-NS-SN-NS configuration. The electrode has been tested in both RF and AF deposition systems. RF sputtering of aluminium from this electrode, and RF PECVD of Ge/C films using a pair of cylindrical electrodes, have been demonstrated in two different experimental set-ups. In the AF deposition system, an application of a pair of electromagnetron electrodes has been shown to allow one to perform simultaneous combination of PECVD of carbon film and sputtering of aluminium, resulting in a possibility to deposit films of gradient concentrations of carbon and aluminium.

Słowa kluczowe

EN

electromagnetron; thin film; sputtering; PECVD

PL

elektromagnetron; cienkie warstwy; metalizacja katodowa

• Wydawca: Centrum Materiałów Polimerowych i Węglowych PAN
• Czasopismo: Polish Journal of Applied Chemistry
• Rocznik: 2005
• Tom: Vol. 49, nr 1-2
• Strony: 11--21
• Opis fizyczny: Bibliogr. 7 poz., Rys. 9

Twórcy

autor

Olcaytug F.

• Albert-Ludwigs University of Freiburg, 79110 Freiburg, Georges-Koehler-Allee 103, Germany

autor

Szymanowski H.

• Technical University of Łódź, Institute of Materials Science and Engineering, ul. Stefanowskiego 1, 90-924 Łódź, POLAND

autor

Kaczmarek M.

• Technical University of Łódź, Institute of Materials Science and Engineering, ul. Stefanowskiego 1, 90-924 Łódź, POLAND

autor

Sobczyk A.

• Technical University of Łódź, Institute of Materials Science and Engineering, ul. Stefanowskiego 1, 90-924 Łódź, POLAND

autor

Rapiejko C.

• Technical University of Łódź, Institute of Materials Science and Engineering, ul. Stefanowskiego 1, 90-924 Łódź, POLAND

autor

Schalko J.

• Technical University of Vienna, Istitute of System and Actuator Systems, Gusshausstrasse 27-29, A-1040 Vienna, Austria

autor

Piplits K.

• Technical University of Vienna, Istitute of Chemical Technology and Analysis, Getreidemarkt 8, A/106 Vienna, Austria

autor

Gazicki-Lipman M.

• Technical University of Łódź, Institute of Materials Science and Engineering, ul. Stefanowskiego 1, 90-924 Łódź, POLAND

autor

Yasuda H.

• University of Missouri-Columbia, Department of Chemical Engineering, MO 65211-2200, Columbia, USA

Bibliografia

• [1] M. Taniguchi, M. Hirose and Y. Osaka, Appl Phys. Lett., 37, 787 (1980).
• [2] H. Biederman and L. Holland, Nucl Instr. & Meth., 212, 497 (1983).
• [3] K. Sato, Y. Iriyama, D.L.Cho and H. Yasuda, J. Vac. Sci.& Technol, A7, 175 (1989).
• [4] K. Sato, Y.-S. Yeh and H. Yasuda, J. Vac. Sci., Technol, A7, 3188 (1989).
• [5] H. Biederman, K. Kohoutek, Z. Chmel, V. Stary and R.P. Howson, Vacuum, 40, 251 (1990).
• [6] M. Gazicki, J. Schalko, F. Olcaytug, M. Ebel, H. Ebel, J. Wernisch and H. Yasuda, J. Vac. Sci. & TechnoL, A12, 345 (1994).
• [7] M. Gazicki, J. Schalko, P. Svasek, F. Olcaytug and F. Kohl, J. Vac. Sci. & Technol., A10, 51 (1992).