PL EN


Preferencje help
Widoczny [Schowaj] Abstrakt
Liczba wyników
Tytuł artykułu

Diamond-like carbon and diamond films as source of electron emission

Identyfikatory
Warianty tytułu
PL
Cienkie warstwy węgla diamnetopodobnego i diamentu jako źródło emisji polowej elektronów
Języki publikacji
EN
Abstrakty
EN
We investigated electron field emission from diamond-like carbon and diamond thin layers. DLC and diamond films were deposited onto Si substrate using Radio Frequency Chemical Vapour Deposition process and Hot Filament Chemical Vapour Deposition technique, respectively. The field emission characteristics were described using the Fowler-Nordheim model. To analyze the surface morphology Raman spectroscopy, Electron Spin Resonance (ESR) and Scanning Electron Microscopy (SEM) was used. We obtained well-defined Raman spectrum peak for diamond films at 1332 cm-1.The Raman spectrum, for DLC layers, showed asymmetric peak consist of D and G-band around 1550 cm-1. It indicate for existence of sp3 (diamond) and s2 (graphite) phase in these films. The field emission for DLC films was obtained at turn-on electric field between 70-90 V/μ while for diamond films in a range between 60-140 V/μ. It seems that changes of turn-on field values and emissive properties of thin carbon layers may be cause by different content graphite phase in carbon films.
PL
Przebadano elektronową emisje polową węgla diamentopodobnego(DLC) i cienkich warstw diamentowych. Charakterystyki emisji polowej zostały opisane w oparciu o model Fowlera-Nordheima. Do analizy morfologii powierzchni zastosowano spektroskopię Ramana, elektronowy rezonans spinowy (ESR) oraz skaningowa mikroskopie elektronowa (SEM). Otrzymano wyraźne widma Ramana dla cienkich warstw diamentowych z maksimum przy 1332 cm-1. Widmo Ramana dla warstw DLC przedstawia asymetryczne składoweDorazG(1550 cm-1). Ta ostatnia świadczy o istnieniu faz sp3 (diament) oraz sp2 (grafit) w tych warstwach. Emisja polowa dla warstw DLC uzyskana była przy ustalonym na 70-90 V/μ.m natężeniu pola elektrycznego, zaś dla warstw diamentowych w przedziale 60-140 V/μm. Pomiary wskazują, że zmiany wartości przyłożonego pola i właściwości emisyjnych cienkich warstw węgla mogą być wywołane różną zawartością fazy grafitowej w warstwach węglowych.
Czasopismo
Rocznik
Tom
Strony
244--251
Opis fizyczny
Bibliogr. 37 poz.
Twórcy
autor
  • Institute of Physics, Technical University of Łódź
  • Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology
  • The Faculty of Mechanical Engineering, Technical University of Łódź
autor
  • Chair of Physics, Kazimierz Wielki University, Bydgoszcz, Department of Biophysics, Collegium Medicum N. Copernicus Univ., Bydgoszcz
autor
  • Chair of Physics, Kazimierz Wielki University, Bydgoszcz
autor
  • The Faculty of Mechanical Engineering, Technical University of Łódź
Bibliografia
  • 1. Aisenberg S., Chabot R., Ion beam deposition of thin film of diamond-like carbon. J. Vac. Sci. Techn., 1971, vol. 8, p. 112.
  • 2. Xu N.S., Huq S.E., Novel cold cathode materials and applications. Mater. Sci. Eng. R, 2005, vol. 48, p. 47.
  • 3. Robertson J., Amorphous carbon cathodes for field emission display. Thin Solid Films, 1997, vol. 296, p. 61.
  • 4. Carey J. D., Forrest R.D., Khan R.U.A., Silva S.R.P., Influence of sp2 clusters on the field emission properties of amorphous carbon thin films. Appl. Phys. Lett., 2000, vol. 77, p. 2006.
  • 5. Roberson J., Mechanism of electron field emission from diamond, diamon-like carbon and nanostructured carbon. J. Vac. Sci. Technol. B, 1999, vol. 17, p. 659.
  • 6. Forbes R.G., Low-macroscopic-field electron emission from carbon films and other electrically nanostructured heterogeneous materials: hypothesis about emission mechanism. Solid State Electronics, 2001, vol. 45, p. 779.
  • 7. Xu N.S., Tzeng Y., Latam R.V., Similarities in the cold electron emission characteristics of diamond coated molybdenium electrodes and polished bulk graphite surfaces. J. Phys, D: Apel. Phys., 1993, vol. 26, p. 1776.
  • 8. Xu N.S., Latam R.V., Tzeng Y., Field dependence of the area-density of cold electron emission sites on broad-area CVD diamond films. Electron Lett., 1993, vol. 29, p. 1596.
  • 9. Zhu W., Kochański P.G., Jin S., Seibles L., Electron field emission from chemical vapor deposition diamond. J. Vac. Sci. Technol. B, 1996, vol. 14, p. 2011.
  • 10. Gröning O., Küttel O.M., Gröning P., Schlapbach L., Field emission spectroscopy from discharge activated chemical vapor deposition diamond. J. Vac. Sci. Technol. B., 1999, vol. 17, p. 1064.
  • 11. Geis M.W., Twichell J.C., Macaulay J., Okano K., Electron field emission from diamond and other carbon materials after H2,O2 and Cs treatment. Appl. Phys. Lett., 1995, vol. 67, p. 1328 .
  • 12.Xu N.S., Latham R.V., Coherently scattered hot electron emitted from MIM graphite microstructures deposited on broad - area vacuum - insulated high-voltage electrode. J. Phys. D., 1986, vol. 19, p. 477.
  • 13. Forbes R., Low-macroscopic-field emission from carbon films and other electrically nanostructured heterogeneous materials: hypotheses about emission mechanism. Solid State Electr., 2001, vol. 45, p. 779.
  • 14. Fabisiak K., Banaszak A., Kaczmarski M., Nucleation and growth of diamond films by using HF CVD technique. Functional Material,2003,vol. 10, p. 117.
  • 15. Haś Z., Mitura S., Wendler B., Takagi T., Proc. International Ion Engineering Congress: ISIAT&IPAT’83, Kyoto, Japan, 1983, vol. 12-16 Sept., p. 1143.
  • 16. Haś Z., Mitura S., Nucleation of allotropic carbon in an external electric field. Thin Solid Films, 1985, vol. 128, p. 353.
  • 17. Haś Z., Mitura S., Wendler B., Takagi T., Proc. International Ion Engineering Congress: ISIAT&IPAT’83, Kyoto, Japan, 1983, vol. 12-16 Sept., p. 1143.
  • 18. Haś Z., Mitura S., Nucleation of allotropic carbon in an external electric field. Thin Solid Films, 1985, vol. 128 p. 353.
  • 19. Fowler R. H., Nordheim L., Electron emission in intense electric fields. Proc. Roy. Soc. Lon. Ser. A., 1928, vol. 119, p. 173.
  • 20. Lee K-R., Eun K. Y., Lee S., Jeon D-R., Field emission behaviour of (nitrogen incorporated) diamond-like carbon fihns. Thin Solid Films, 1996, vol. 290-291,p. 171.
  • 21. May P.W., Hohn S., Wang W.N., Fox N.A., Field emission conduction mechanisms in chemical vapour deposited diamond and diamond like carbon films. Appl. Phys. Lett., 1998, vol. 72, p. 2182.
  • 22. Inomoto H, Hatta A., Kawabata K., Katoda T., Hiraki A., Electron field emission from diamond-like carbon films after dielectric breakdown and from diamond films after the activation process. Diamond Relat. Mater., 2000, vol. 9, p. 1209.
  • 23. Luo J.Y., Liu K.S., Lee J.S.. Lin I.N, Cheng H.F., The influence of film-to-substrate characteristics on the electron field emission behaviour of the diamond films. Diamond Rel. Mater., 1998, vol. 7, p. 704.
  • 24. Znamirowski Z., Staryga E., Jarzyńska D., Nikliborc K., Karczemska A., Green M., Some emission properties of DLC films on Si substrates. Proc. International Conference 4-th Nanodiamond and Related Materials jointly with 6-th Diamond and Related Films, Zakopane, Poland, 28.06-1.07.2005, p. 149 .
  • 25. Gröning O., Kuttel O.M., Gröning P., Schlapbach L., Field emission from DLC films. Appl. Surface Sci., 1997, vol. 111, p. 135.
  • 26. Staryga E., Bąk G.W., Relation between physical structure and electrical properties of diamond-like carbon thin films. Diamond Relat. Mater., 2005, vol. 14, p. 23.
  • 27. Nebel C.E., Electronic properties of CVD diamond. Semicond. Sci. Technol., 2003, vol. 18, p. S1 -S11.
  • 28. Karabutov A.V., Frolov V.D., Konov V.I., Diamond/sp2-bonded carbon structures: quantum well field electron emission? Diamond Relat. Mater., 2001, vol. 10, p. 840.
  • 29. Cui J. B., Stammler M., Ristein J., Ley L., Role of hydrogen on field emission from chemical vapour deposited diamond and nanocrystalline diamond powder. J. Appl. Phys., 2000, vol. 88. p. 3667.
  • 30. Xu N. S., Huq S. E., Novel cold cathode materials and applications. Mater. Sci. and Eng., Rep.: A Rev. J. R., 2005, vol. 48, p. 47.
  • 31. Gruen D.M., Nanocrystalline diamond films. Annu. Rev. Mater. Sci., 1999, vol. 29, p. 211.
  • 32. LoubserJ.H., Van Wyk J.A., ESR in the study of diamond. Rep. Progr. Phys., 1978, vol. 41, p. 1203.
  • 33. Smith M.J.A., Angel B.R., Emmons R.G., Distribution of substitutional nitrogen donors in synthetic diamonds. Nature, 1966, vol. 210, p. 692.
  • 34. Fabisiak K., Patyk J.K., Rozpłoch F., CVD diamond films quality characterization by ESR, SEM and Raman Spectroscopy. Acta Physica Polonica, 1995, vol. 87, p. 145.
  • 35. Fabisiak K., Rozpłoch F., ESR and X-ray diffraction studies of CVD diamond films. Appl. Magn. Reson., 1997, vol. 12, p. 53.
  • 36. Orzeszko S., Bała W., Fabisiak K, Rozpłoch F., DC conductivity and ESR of hydrogenated amorphous carbon films. Phys. Stat. Sol.(a).,1984, vol.81, p. 579.
  • 37. Fabisiak K., Analiza defektów w cienkich polikrystalicznych warstwach diamentowych otrzymywanych metodami CVD. Wydawnictwo Uniwersytetu Mikołaja Kopernika, Toruń 1994 (in polish).
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BPP1-0059-0029
JavaScript jest wyłączony w Twojej przeglądarce internetowej. Włącz go, a następnie odśwież stronę, aby móc w pełni z niej korzystać.