Surface electrical effects at the oxygen/zirconia interface during oxidation

• Autorzy: Bąk T. , Nowotny J. , Rękas M. , Sorrell C. C.
• Języki publikacji: EN

Abstrakty

EN

This paper describes application of a high temperature Kelvin probe (HTKP) for studies of the outermost surface layer of materials and related charge transfers (at or in this layer) at elevated temperatures in the gas phase of controlled composition. Specifically, the paper considers application of the HTKP for surface monitoring of yttria-stabilized zirconia (10Y—ZrO(2) during isothermal oxidation at 1073 and 1173 K. The obtained work function (WF) data are discussed in terms of oxygen reactivity with zirconia involving (i) oxygen chemisorption and (ii) oxygen incorporation into the outermost surface layer.

Słowa kluczowe

EN

zirconia; oxide materials; interface; chemisorption; defect chemistry; work function

PL

dwutlenek cyrkonu; utlenianie; granica międzyfazowa; chemisorpcja; defekt chemiczny; energia swobodna

• Wydawca: Centrum Upowszechniania Nauki PAN
• Czasopismo: Bulletin of the Polish Academy of Sciences. Chemistry
• Rocznik: 2001
• Tom: Vol. 49, No. 1
• Strony: 67--73
• Opis fizyczny: Bibliogr. 4 poz.

Twórcy

autor

Bąk T.

autor

Nowotny J.

autor

Rękas M.

autor

Sorrell C. C.

• Centre for Materials Research in Energy Conversion, School of Materials Science and Engineerging, The University of New South Wales, UNSW Sydney, NSW 2052, Australia,