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Metody spektroskopii emisyjnej do badania parametrów plazmy generowanej elektrycznie
Języki publikacji
Abstrakty
Plasma technology is one of the modern technologies which could improve traditional processes or can be involved in novel innovative solutions resulting in new market products. Technological plasma today requires better control of the manufacturing processes to obtain high quality products. In the paper, electrically generated plasma has been investigated using optical emission spectroscopy, which is a non-invasive technique for gaining information about main plasma parameters. The spectroscopy method allows better understanding of the discharge processes.
Technologie plazmowe należą do nowoczesnych technologii produkcji, które umożliwiają usprawnienie konwencjonalnych metod wytwarzania lub mogą prowadzić do powstania nowych produktów rynkowych. Współcześnie plazma technologiczna używana do procesów produkcyjnych wymaga lepszej diagnostyki jej parametrów. W artykule zastosowano metody spektroskopii emisyjnej do badania parametrów plazmy generowanej elektrycznie. Zastosowana metoda spektroskopowa pozwala na lepsze zrozumienie procesów zachodzących w plazmie.
Wydawca
Czasopismo
Rocznik
Tom
Strony
98--100
Opis fizyczny
Bibliogr. 23 poz., rys., tab.
Twórcy
autor
autor
autor
- Instytut Maszyn Przepływowych im. Roberta Szewalskiego PAN, 80-952 Gdańsk ul. Fiszera 14, E-mail: czech@imp.gda.pl; Arkadiusz Sobczyk, Instytut Ma, czech@imp.gda.pl
Bibliografia
- [1] Tendero C., Tixier Ch., Tristant P., Desmaison J., Leprince Ph., Atmospheric pressure plasmas: A review. Spectrochim. Acta Part B 61 (2006), 2-30
- [2] Timmermans E.A.H., Atomic and Molecular Excitation Processes in Microwave Induced Plasmas spectroscopic study, Eindhoven. PhD Thesis, Eindhoven 1999
- [3] Timmermans E.A.H., Jonkers J., Thomas I.A.J., Rodero A. , Quintero M.C. , Sol a A . , Gamero A., van der Mul len J .A.M. , The behavior of molecules in microwave-induced plasmas studied by optical emission spectroscopy. 1. Plasmas at atmospheric pressure. Spectrochimica acta. Part B. (1998), 1553-1566
- [4] Harry J. E., Yuan Q., Distinguishing discharge modes using their spectral lines. Int. J. Electronics 87 No.9 (2000), 1105-1112
- [5] Denat A., Bonifaci N., Nur M., Spectral Analysis of the light emitted by streamers in hydrocarbon liquids, IEEE Trans. Dielectric Electr. Insul. EI 5 No.3 (1998), 382-387
- [6] Benmansour M., Nikravech M., Morvan D., Amouroux J., Chapelle J., Diagnostic by emission spectroscopy of an argon-hydrogen RF inductive thermal plasma for purification of metallurgical grade silicon. J. Phys. D; Appl. Phys.37 No. 21 (2004), 2966-2974
- [7] Jasiński M., Zakrzewski Z., Mizeraczyk J., Spectroscopic measurements of electron density in atmospheric-pressure surface wave sustained discharge in argon. Czech. J. Phys. 56 (2006), Part 4, Suppl. B, B787-B794
- [8] Sun M., Wu Y., Li J ., Wang N.H., Wu J., Shang K.F., Zhang J.L., Diagnostic of OH radical by optical emission spectroscopy in atmospheric pressure unsaturated humid air corona discharge and its implication to desulphurization of flue gas. Plasma Chem. Plasma Proc. 25 (2005), No.1, 31-40
- [9] Jaworek A., Sobczyk A., Rajch E., Investigations of corona and back discharge characteristics in various gases. J. Phys. Conf. Ser. 142 (2008), 012040
- [10] Jaworek A., Czech T., Rajch E., Lackowski M., Spectroscopic studies of electric discharges in electrospraying. J. Electrostatics 63 No.6-10 (2005), 635-641
- [11] Griem H.R. , Plasma spectroscopy, San Francisco, Toronto, London, 1964
- [12] Paris P., Aints M., Valk F., Plank T., Haljaste A. , Intensity ratio of nitrogen bands as a function of field strength, XXVII ICPIG, Eindhoven, 18-22 July 2005
- [13] Su Peng-hao, Zhu Yi-Min, Yang Shu, Using OES to measure distribution of energetic electron in multi-needle-toplate corona discharge. J. Electrostatics 66 No.3-4 (2008), 193-196
- [14] Shimizu K., Saeki Sh., Yamada G., Oda T., Emission spectrometry of NO or activated nitrogen species in non-thermal plasma, Sci. Techn. Adv. Mater. 2 (2001), 577-585
- [15] Chatei H., Belmahi M. , Assouar M.B. , Le Brizoual L., Bourson P. , Bougdira J., Growth and characterization of carbon nanostructures obtained by MPACVD system using CH4/CO2 gas mixture. Diamond Related Mater. 15 (2006), 1041-1046
- [16] Chen G.S., Lee C.C., Niu H., Huang W., Jann R., Schüte T., Sputter deposition of titanium monoxide and dioxide thin films with controlled properties using optical emission spectroscopy. Thin Solid Films 516 (2008), No. 23, 8473-8478
- [17] Jasiński M., Mizeraczyk J., Zakrzewski Z, Measurements of neutral gas temperature in microwave torch plasmas at atmospheric pressure. Czech. J. Phys. 52 (2002), Suppl. D, 421-426
- [18] Tomai T., Katahira K., Kubo H., Shimizu Y., Koshizaki N., Terashima K., Carbon materials synthesis using dielectric barrier discharge in carbon dioxide environments. Supercritical Fluids 41 (2007), 404-411
- [19] Babou M., Rivière Ph., Perrin M.-Y., Soufiani A., Spectroscopic study of microwave plasmas of CO2 and CO2-N2 mixtures at atmospheric pressure. Plasma Sources Sci. Techn. 17 (2008), 1-11
- [20] White H.J., (1963), Industrial Electrostatic Precipitation. Addison-Wesley 1963
- [21] Masuda S., Mizuno A.: Initial condition and mode of back discharge, J. Electrostatics, 4 (1977/1978), 35-52
- [22] Jaworek A., Czech T., Rajch E., Lackowski M., Laboratory studies of back-discharge in fly ash. J. Electrostatics 64 (2006), No.5, 326-337
- [23] Rond C., Bultel A., Boubert P., Chéron B.G., Spectroscopic measurement of nonequilibrium CO2 plasma in RF torch. Chem. Phys. 354 (2008), 16-26
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BPOC-0057-0030