Effect of oxygen nonstoichiometry of ceramic targets on deposition process of TiO2 by DC magnetron sputtering

• Autorzy: Tomaszewski H.
• Języki publikacji: EN

Abstrakty

EN

The deposition of stoichiometric TiO, films for V2O5/ TiO2 catalysts was investigated. DC magnetron sputtering from ceramic oxide targets in an argon/oxygen atmosphere was chosen as deposition technique. Ceramic TiO 2- x targets with a wide range of oxygen nonstoichiometry were prepared following a standard ceramic procedure starting from TiO, and Ti powders. The effect of oxygen nonstoichiometry on target behaviour upon sputtering was followed by means of the target voltage. Increase of voltage maximum with increasing nonstoichiometry of ceramic target was observed and discussed. Optical properties of layers prepared with different oxygen concentrations in the plasma were investigated.

Słowa kluczowe

EN

oxygen; nonstoichiometry

PL

tlen; związki niestechiometryczne

• Wydawca: Sieć Badawcza Łukasiewicz - Instytut Technologii Materiałów Elektronicznych
• Czasopismo: Materiały Elektroniczne
• Rocznik: 2003
• Tom: T. 31, nr 1-2
• Strony: 30--43
• Opis fizyczny: Bibliogr. 20 poz., wykr.

Twórcy

autor

Tomaszewski H.

• Instytut Technologii Materiałów Elektronicznych, Ul. Wólczyńska 133 01-919 Warszawa,

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