Liquid phase deposition methods monitoring techniques influence for solid substrates and thin metal oxide films properties

• Autorzy: Valiulis A. V. , Silickas P.
• Języki publikacji: EN

Abstrakty

EN

Purpose: Liquid phase deposition (LPD) method is a useful method to create thin oxide films from aqueous solutions under ambient conditions. Deposition of ceramic layers on polymers is a technological challenge because of polymer sensitivity to chemicals and high temperature processing. Design/methodology/approach: The work attempts to elucidate the role of the substrate during LPD of TiO2 films by using Kapton with different types of surface treatments. Findings: Was found that small differences in pH, temperature, and solution composition can lead to dramatic differences in the film's crystallinity, adherence, and growth rate. Thin films are very smooth, uniform with small amount of cracks. Research limitations/implications: Independent of technique and substrate, film thicker than a few hundred nm exhibited cracks, attributed to stresses that result during drying of the film. Originality/value: Techniques for monitoring the surface chemistry of the solid substrate and the deposited ceramic film have been developed.

Słowa kluczowe

EN

mechanical properties; thin films; deposition methods

PL

właściwości mechaniczne; cienkie warstwy; metody osadzania powłok

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2007
• Tom: Vol. 24, nr 1
• Strony: 188--192
• Opis fizyczny: Bibliogr. 6 poz., fot., rys.

Twórcy

autor

Valiulis A. V.

autor

Silickas P.

• Department of Material Science and Welding, Vilnius Gediminas Technical University, Basanavičius st. 28, Vilnius, Lithuania,

Bibliografia

• [1] T.P. Niesen, M.R. De Guire, Deposition of Ceramic Thin Films at Low Temperatures from Aqueous Solutions, Journal of Electroceramics 6/3 (2001) 169-207.
• [2] K. Koumoto, S. Seo, T. Sugiyama, W.S. Seo. W. Dressick, Micropatterning of Titanium Dioxide on Self-Assembled Monolayers Using a Liquid-Phase Deposition Process, Journal Chemistry of Materials 11/9 (1999) 2305-2309.
• [3] A.J. Pertsin, Y.M. Pashunin, An XPS Study of the In-Situ Formation of the Polyimide/Copper Interface, Applied Surface Science 47/2 (1991) 115-125.
• [4] S. Deki, Y. Aoi, Y. Miyake, A Kajinami, Novel wet process for preparation of vanadium oxide thin film, Materials Research Bulletin 31/11 (1996) 1399-1406.
• [5] H. Pizem, O. Gershevitz, Y. Goffer, A.A. Frimer, C.N. Sukenik, U. Sampathkumaran, X. Milhet, A. Mcllwain, M.R. De Guire, M.A. Meador, J.K. Sutter, Titania deposition on PMR-15, Chemica Materialia 17 (2005) 3205-3213
• [6] P. Silickas, A.V. Valiulis, Liquid phase deposition and properties of thin Zr dioxide films on different substrates, Proceedings of 2nd International Conference Mechatronic Systems and Materials, Cracow, Poland, 2006, (CD-ROM).