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Characterisation of TiCxOy thin films produced by PVD techniques

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Języki publikacji
EN
Abstrakty
EN
Purpose: The purpose of this work consists in the characterisation of TiCxOy thin films produced by dc reactive magnetron sputtering. The main goal consists in studying the influence of the reactive gas flow in the atomic composition, structure, colour and electrical and mechanical properties of the films. Design/methodology/approach: All the deposition parameters were maintained constant except the reactive gas flow. After deposition, the properties of the coatings were measured and were related with variation of reactive gas flow. Findings: The results show that the films properties subsist into 3 different regimes - i) carbide, ii) a transition zone and iii) an oxide one. The colour results indicate a strong dependence on the O/Ti ratio. A progressive reduction of hardness and residual stresses with increasing of the O/Ti ratio was observed. The residual stresses, as well as the film structure, seem to play an important role on the adhesion of the coatings. Research limitations/implications: The main limitation of this work is linked to the deposition technique itself. It is difficult to avoid surface defects and pinholes that strongly influence the tribological results. Practical implications: TiCxOy thin films are multifunctional due to present good electrical and optical properties but also good mechanical properties which allow them to be used in several applications; from decorative to electronic applications. Originality/value: There is a new class of coatings where the research of TiCxOy thin films is included: the multifunctional coatings. This class of coatings should be easy to prepare and to tune the properties as function of particular applications. This characteristic may be extremly important to advanced coatings industry.
Rocznik
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35--38
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Bibliogr. 15 poz., rys., tab.
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Bibliografia
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  • [2] Dahan, A. Admon, N. Frage, J. Sariel, M.P. Dariel, J.J. Moore, The development of a functionally graded TiC-Ti multilayer hard coating, Surface and Coatings Technology 137 (2001) 111-115.
  • [3] A.A. Voevodin, M.A. Capano, S.J.P. Laube, M.S. Donley, J.S. Zabinski, Design of a Ti/TiC/DLC functionally gradient coating based on studies of structural transitions in Ti—C thin films, Thin Solid Films 298 (1997) 107-115.
  • [4] Czyzniewski, W. Precht, Deposition and some properties of nanocrystalline, nanocomposite and amorphous carbon-based coatings for tribological applications, Journal of Materials Processing Technology 157-158 (2004) 274-283.
  • [5] S. López, S. Granados, S. Muhl, O. Alvarez-Fregoso and J. A Chavez-Carvayar, Acrylic-acid route for the fast chemical vapour deposition of titanium carbide films, Journal of Materials Processing Technology 72 (1997) 330-331.
  • [6] E. Kusano, A. Sato, N. Kikuchi, H. Nanto, A. Kinbara, Preparation of TiC films by alternate deposition of Ti and (layers using a dual magnetron sputtering source, Surface and Coatings Technology 120 (1999) 378-382.
  • [7] M.Y.Noordin, V.C. Venkatesh, C.L. Chan, A. Abdullah, Performance evaluation of cemented carbide tools in turning AISI 1010 steel, Journal of Materials Processing Technology 116 (2001) 16-21.
  • [8] B. Wendler, M. Danielewski, K. Przybylski, A. Rylski, Ł. Kaczmarek and M. Jachowicz, New type AlMo-, AITi- or Si-based magnetron sputtered protective coatings on metallic substrates, Journal of Materials Processing Technology 175 (2006) 427-432.
  • [9] Recommendations on Uniform Color Spaces, Difference equations, psychometric color terms, CI: Publication, No 2-70 (Commission Internationale de L'Éclairage) 15 (1978).
  • [10] G.G. Stoney, Proc. R. Soc. London A 82, 172 (1909).
  • [11] Mani, P. Aubert, F. Mercier, H. Khodja, С Berthier, P. Houdy, Effects of residual stress on the mechanical and structure properties of TiC thin films grown by RF sputtering, Surface and Coatings Technology 194 (2005) 190-195.
  • [12] M. Stüber, H. Leiste, S. Ulrich, H. Hollek, D. Schild Microstructure and properties of low friction TiC — C nanocomposite coatings deposited by magnetron sputtering Surface and Coatings Technology 150 (2002) 218-226.
  • [13] T. Zehnder, J. Patscheider, Nanocomposite TiC/a-C:H hard coatings deposited by reactive PVD, Surface and Coatings Technology 133 (2000) 138-144.
  • [14] Leonhardt, H. Liepack, K. Bartsch, CVD of TiCx/a-C-layers under d.c.-pulse discharge, Surface and Coatings Technology 133 (2000) 186-190.
  • [15] W. Gulbiński. S. Mathur, H. Shen, T. Suszko, A. Gilewicz, B. Warcholiński, Evaluation of phase, composition microstructure and properties in TiC/a-C:H thin films deposited by magnetron sputtering, Applied Surface Science 239 (2005) 302-310.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BOS3-0016-0061
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