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Wpływ materiału na nanomechaniczne zachowanie się supersieci TiN/NbN i TiN/NbN nałożonych na krzem.
Języki publikacji
Abstrakty
In the paper are presented the results of tests of nanomechanical behaviour of ultrathin (200 nm) multilayers films (superlattices) deposited by PVD technique on the single crystal Si, Si3N4 and SiO2 substrates. The superlattices were produced by various combinations of ultrathin single layers of NbN, TiN and CrN. The evaluation of the effect of the material (and the substrate) on the nanohardness and modulus of elasticity was found from the nanoindentation studies. It was observed that TiN/CrN superlattices deposited on Si demonstrates the best mechanical properties (nanohardness over 21 GPa). The best uniformity of the films was found for the TiN/CrN superlattices deposited on Si3N4.
W pracy przedstawiono wyniki badań nanomechanicznego zachowania się ultracienkich (200 nm) powłok wielowarstwowych (supersieci) nanoszonych metodą PVD na podłoża Si, Si3N4 i SiO2. Supersieci wykonywano z kombinacji warstw azotków NbN, TiN i CrN. Oceniono wpływ materiału na uzyskiwanie wartości nanotwardości i modułu sprężystości, wyznaczone metodą nanoindentacji. Zaobserwowano, że najlepsze właściwości mechaniczne (twardość powyżej 21GPa) wykazują supersieci TiN/CrN na podłożu Si, natomiast najlepszą jednorodnością charakteryzują się supersieci TiN/CrN na podłożu Si3N4.
Wydawca
Czasopismo
Rocznik
Tom
Strony
201--209
Opis fizyczny
Bibliogr. 14 poz.
Twórcy
autor
- Institute of Electron Technology, al. Lotników 32/46, 02-668 Warszawa
autor
- Warsaw University of Technology, Department of Mechatronics, Institute of Micromechanics and Photonics, Chodkiewicza 8, 02-525 Warszawa, Poland
autor
- Warsaw University of Technology, Department of Mechatronics, Institute of Micromechanics and Photonics, Chodkiewicza 8, 02-525 Warszawa, Poland
autor
- Institute of Electron Technology, al. Lotników 32/46, 02-668 Warszawa
Bibliografia
- [1] Petrov, L., Hultman, U., Helmersson, J.E., Sundgren, J.E., Green: Microstructure modification ofTiN by ion bombardment during reactive sputter deposition. Thin Solid Films No 169/1989. Edit. Elsevier.
- [2] Sproul, W.D., Rudnik, P.J., Graham, M.E.: The effect of N2 partial pressure, deposition rate and substrate bias potential on the hardness and texture of reactively sputtered TiN coatings. Surface Coatings Technology No 39-40/1989. Edit. Elsevier.
- [3] Mirkarimi, B., Barnett, S.A., Hubbard, K.M., Jervis, T.R., Hultman, L.: Structure and mechanical properties of epitaxial TiN/V0.3Nb07N (100) superlattices. Journal Materials Research No 9/1994. Edit. MRS.
- [4] Daniels, B.D., Nix, W.D., Clemens, B.M.: Enhanced mechanical hardness in compositionally modulated Fe(001)Pt(001) and Fe(001)Cr(001) epitaxial thin films. Thin Solid Films No 253/1994. Edit. Elsevier.
- [5] Lu, X.C., Shi, B., Li, L.K.Y., Luo, J., Chang, X., Tian, Z., Mou, J.I.: Nanoindentation and microtribological behaviour of Fe-N/Ti-N multilayers with different thickness ofTi-N layers. Wear No 251 /2001. Edit. Elsevier.
- [6] Sundararajan, S., Bhushan, B.: Micro/nanoscale tribology of MEMS materials, lubricants and device., in. Abstracts Papers Posters World Tribology Congress Vienna 3-7, 2001, CD disk, Österreichische Tribologische Gesellschaft, Viena 2001, ISBN 3-901657-09-6.
- [7] Bhushan, B.: Principles and Applications of Tribology. 1999. Edit by John Wiley and Sons, New York-Chchester.
- [8] Rymuza, Z.: Control mechanical and tribological properties of MEMS surfaces. Part 1. Microsystem Technologies 5/1999. Edit. Springer Verlag.
- [9] Larsson, M., Bromark, M., Hendenqvist, P., Hogmark, S.: Deposition and microstructure of PVD TiN/NbN multilayered coatings by combined reactive electron beam evaporation and DC sputtering. Surface Coatings Technology No 86-87/1996. Edit. Elsevier.
- [10] Tomlinson, M., Lyon, S.B., Hovsepian, P.Eh., Münz, W.D.: Corrosion performance of CrN/NbN superlattice coatings deposited by the combined cathodic arc/unbalanced magnetron technique. Vacuum No 53/1999. Edit. Elsevier.
- [11] Punjan, P., Navinsek, B., Milosev, I.: Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilaer hard coatings reactively sputtered at low temperature. Thin Solid Films No 281-282/1996. Edit. Elsevier.
- [12] Shinn, M., Hultman, L., Barnett, S.A.: Growth, structure and microhardness of epitaxial TiN/NbN superlattice. Journal Materials Research No 7/1992. Edit MRS.
- [13] Wolkenberg, Wrzesińska, H., Bochenek, A., Tokarz, A., Nitkiewicz, Z.: The hardness of CrN, NbN, TiN layers deposited on monocrystalline Si wafers. Inżynieria Materiałowa No 5/2001. Edit. SIGMA NOT.
- [14] Rymuza, Z., Misiak, M., Grabiec, P., Rangelow, I., Sossna, E., Sunyk, R.: Nanomechanical behaviour of silicon. Tribologia 30 No.3/1999. Edit. ITE and SIMPRESS.
Typ dokumentu
Bibliografia
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bwmeta1.element.baztech-article-BOS3-0008-0086