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Atmospheric pressure plasma jet for treatment of polymers

Wybrane pełne teksty z tego czasopisma
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Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Purpose: Polymers are commonly used as packing materials as well as for optical and microelectronic applications. For these purposes different requirements like impermeability for different gases, scratching firmness and electrical conductivity are demanded. Since, polymers usually do not exhibit these attributes a surface modification is necessary. Design/methodology/approach: This paper describes possibilities for coating of polymers with a cold atmospheric pressure plasma jet (APPJ). Due to the rather low temperature of the process the plasma jet is suitable for the treatment of temperature-sensitive materials with melting points below 150°C. For coating of polymers the organic precursor Hexamethyldisiloxane (HMDSO) has been used to deposit silicon oxide layers on surface. Findings: Spatial distributions of reactive species have been measured by optical emission spectroscopy (OES) in the range between 280 and 1100 nm during the plasma process. The energy influx to the substrate was determined by thermal probe measurements. For the affirmation of the chemical composition of the surface X-ray photon spectroscopy (XPS) has been performed. Practical implications: It could be confirmed that SiOx thin film deposition on polymeric substrate using commercially available APPJ with no internal precursor feeding is possible. Originality/value: The examinations of atmospheric pressure plasma jet for treatment of polymers.
Rocznik
Strony
730--734
Opis fizyczny
Bibliogr. 14 poz., rys., tabl.
Twórcy
autor
autor
autor
autor
  • Institute for Experimental and Applied Physics, Plasma Technology Group, Christian-Albrechts-University Kiel, Leibniz Str. 11-19, D-24118 Kiel, Germany, wolter@physik.uni-kiel.de
Bibliografia
  • [1] E. Stoffels, A. J. Flikweert, W. W. Stoffels, G. M. W. Kroesen, Plasma needle: a non-destructive atmospheric plasma source for fine surface treatment of (bio)materials, Plasma Sources Science and Technology 11 (2002) 383-388.
  • [2] R. Foest, Th. Bindemann, R. Brandenburg, E. Kindel, H. Lange, M. Stieber, K-D Weltmann, On the Vacuum Ultraviolet Radiation of a Miniaturized Non-thermal Atmospheric Pressure Plasma Jet, Plasma Processes and Polymers 4/0 (2007) S460-S464.
  • [3] L. Zajickova, V. Bursikova, Z. Kucerova, D. Franta, P. Dvorak, R. Smid, V. Perina, A. Mackova, Deposition of protective coatings in rf organosilicon discharges, Plasma Sources Science and Technology 16 (2007) S123-S132.
  • [4] S. Kurosawa, H. Harigae, H. Aizawa, K. Terashima, H. Suzuki, Gas recognition folms fabricated by microplasma technology, Journal of Photopolymeres Science Technology 19 (2006) 253-257.
  • [5] L. Zajickova, V. Bursikova, Z. Kucerova, J. Franclova, P. Siahel, V. Perina, A. Mackova, Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties, Journal of Physical Chemistry Solids 68 (2007) 1255-1259.
  • [6] D. Hegemann, H. Brunner, C. Oehr, Deposition Rate and Three-dimensional Uniformity of RF Plasma Deposited SiOx Films, Surface Coating Technology 142 (2001) 849-855.
  • [7] D. Hegemann, U. Vohrer, C. Oehr, R. Riedel, Deposition of SiOx films from O2/HMDSO plasmas, Surface Coating Technology 119 (1999) 1033-1036.
  • [8] J. Thorton, Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings, Journal of Vacuum Sciences and Technology 11/4 (1974) 666-670.
  • [9] H. Deutsch, H. Kersten, A. Rutscher, Basic Mechanisms in Plasma Etching, Contribution to Plasma Physics 29 (1989) 263-284.
  • [10] S. Bernstein, T. Wong, R. Tustison, Effects of substrate temperature and angular position on the properties of ion beam sputter deposited Fe films on (100) GaAs substrates, Journal of Vacuum Sciences and Technology B 12/2 (1994) 605-612.
  • [11] R. Foest, E. Kindel, A. Ohl, M. Stieber, K. D. Weltmann, RF Capillary Jet - a Tool for Localized Surface Treatment, Contribution to Plasma Physics 47 (2007) 72-79.
  • [12] H. Kersten, H. Deutsch, H. Steffen, G.M. Kroesen, R. Hippler, The energy balance at substrate surfaces during plasma processing, Vacuum 63 (2001) 385-431.
  • [13] M. Wolter, M. Stahl, H. Kersten, Spatially resolved thermal probe measurement for the investigation of the energy influx in an rf-plasma, Vacuum 83 (2009) 768-772.
  • [14] R. Basner, R. Foest, M. Schmidt, K. Becker, H. Deutsch, Absolute total and partial electron impact ionization cross sections of hexamethyldisiloxane, International Journal of Mass Spectrometry 176 (1998) 245-252.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BOS2-0021-0084
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