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Influence of the vacuum-arc source configuration and arc discharge parameters on the evolution and location of arc spots on the cathode surface

Wybrane pełne teksty z tego czasopisma
Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Purpose: The paper presents investigations of the evolution, structure and location of arc spots on the cathode frontal surfaces of two types of industrial arc sources. Design/methodology/approach: The temporal behaviour of cathode spots was recorded with the use of a fast CCD camera. The experiments were performed at four values of arc current, nine compositions of the process atmosphere N2+C2H2 and three pressure ranges of the process atmosphere. Findings: The analysis of the recorded pictures revealed the fine structure of the arc discharge for the investigated range of process conditions. Both temporal and spatial behaviour of cathode spots were different for both investigated arc sources. The correspondence between radial distributions of the cathode spots on the cathode surface and radial distribution of plasma flow elements analysed in the volume of the vacuum chamber was revealed. Research limitations/implications: The paper show experimental methodology that can be used for the research of the specificity of cathode spots movement on the cathodes made from different materials. Originality/value: The originality of the research presented in the paper consists in assigning overall correlation between vacuum-arc source configuration and parameters of vacuum-arc discharge – on the one hand, and space-time behaviour of the arc spots during their movement on the circular cathode surface and radial distribution of excited and ionized atoms of the cathode material in the deposition chamber – on the other.
Rocznik
Strony
719--725
Opis fizyczny
Bibliogr. 15 poz., rys., tabl.
Twórcy
autor
autor
autor
autor
  • Institute of Mechatronics, Nanotechnology and Vacuum Technique, Koszalin University of Technology, ul. Racławicka 15-17, 75-620 Koszalin, Poland, jan.walkowicz@tu.koszalin.pl
Bibliografia
  • [1] L. A. Dobrzański, M. Staszuk, J. Konieczny, J. Lelątko, Structure of gradient coatings deposited by CAE-PVD techniques, Journal of Achievements in Materials and Manufacturing Engineering 24/2 (2007) 55-58.
  • [2] L. A. Dobrzański, M. Staszuk, M. Pawlyta, W. Kwaśny, M. Pancielejko, Characteristic of Ti(C,N) and (Ti,Zr)N gradient PVD coatings deposited onto sintered tool materials, Journal of Achievements in Materials and Manufacturing Engineering 31/2 (2008) 629-634.
  • [3] L. A. Dobrzański, K. Lukaszkowicz, J. Mikuła, D. Pakuła, Structure and corrosion resistance of gradient and multilayer coatings, Journal of Achievements in Materials and Manufacturing Engineering 18 (2006) 75-78.
  • [4] J. Kusiński, M. Rozmus, J. Bujak, Investigation of the life-time of drills covered with the anti-wear Cr(C, N) complex coatings, deposited by means of Arc-PVD technique, Journal of Achievements in Materials and Manufacturing Engineering 33/1 (2009) 86-93.
  • [5] R. L. Boxman, P. J. Martin, D. M. Sanders (eds.), Handbook of vacuum arc science and technology. Fundamentals and applications, Noyes Publications, Park Ridge, 1995.
  • [6] J. M. Lafferty (ed.), Vacuum arcs. Theory and application, John Wiley and Sons, New York-Chichester-Brisbane- Toronto, 1980.
  • [7] H. O. Schrade, Arc cathode spots: Their mechanism and motion, IEEE Transactions on Plasma Science 17 (1989) 635-637.
  • [8] A. E. Robson, The motion of a low-pressure arc in a strong magnetic field, Journal of Physics D: Applied Physics 1 (1978) 1917.
  • [9] M. G. Drouet, The physics of the retrograde motion of the electric arc, Japanese Journal of Applied Physics 20 (1981) 1027-1036.
  • [10] I. G. Kiesaiev, Cathodic processes of the electric arc, Moscow, Science 1968 (in Russian).
  • [11] J. Walkowicz, J. Smolik, R. Brudnias, B. Kułakowska- Pawlak, W. Żyrnicki, Correlation between spatial distribution of the components of reactive plasma flow and the stoichiometry and defectiveness of deposited coatings, Journal of Achievements in Materials and Manufacturing Engineering (in print).
  • [12] L. P. Harris, Arc cathode phenomena, in: Vacuum arcs: Theory and Application, John Wiley & Sons, New York, 1980.
  • [13] J. Kutzner, H. C. Miller, Ion flux from the cathode region of a vacuum arc, IEEE Transactions on Plasma Science 17 (1989) 688.
  • [14] J. Walkowicz, On the mechanisms of diode plasma nitriding in N2-H2 mixtures under DC-pulsed substrate biasing, Surface and Coatings Technology 174-175 (2003) 1211.
  • [15] B. E. Djakov, R. Holmes, Cathode spot structure and dynamics in low-current vacuum arcs, Journal of Physics D: Applied Physics 7 (1974) 569-580.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BOS2-0021-0082
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