Correlation between spatial distribution of the components of reactive plasma flow and the stoichiometry and defectiveness of deposited coatings

• Autorzy: Walkowicz J. , Smolik J. , Brudnias R. , Kułakowska-Pawlak B. , Żyrnicki W.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The subject of the presented research was reactive plasma generated by circular vacuum-arc sources used for deposition of thin hard coatings. Design/methodology/approach: Experimental investigations on spatial distribution of ionized and excited plasma components were performed with the use of the optical emission spectroscopy. Quantitative analysis of microdroplets distribution was carried out using measuring optical microscope supplied with the numerical image analysis system. Findings: Based on the obtained radial distributions of volatile and condensed components the general picture of plasma flow emitted by a single circular arc source was reconstructed. Radial distributions of analysed emitting elements and analysed fractions of microdroplets showed layered structures that depended on the discharge conditions. Research limitations/implications: The spectral method used for the reconstruction of concentration distributions of ionised and excited plasma components generated by a single circular arc source could not be used for reconstruction of such distributions in the vacuum chamber of the industrial device. Originality/value: The carried out investigations showed that the differences in spatial distributions of plasma active elements determine the uniformity of crystallization conditions in vacuum-arc deposition processes performed in large-scale multi-source industrial devices.

Słowa kluczowe

EN

thin coating; thick coating; arc evaporation; titanium nitride; carbonitride; colorimetry

PL

cienka powłoka; gruba powłoka; odparowanie łukowe; azotek tytanu; azotek węgla; kolorymetria

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 37, nr 2
• Strony: 712--718
• Opis fizyczny: Bibliogr. 15 poz., rys., tabl.

Twórcy

autor

Walkowicz J.

autor

Smolik J.

autor

Brudnias R.

autor

Kułakowska-Pawlak B.

autor

Żyrnicki W.

• Institute of Mechatronics, Nanotechnology and Vacuum Technique, Koszalin University of Technology, ul. Racławicka 15-17, 75-620 Koszalin, Poland,

Bibliografia

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