The application of CVD diamond films in cyclic voltammetry

• Autorzy: Torz-Piotrowska R. , Wrzyszczyński A. , Paprocki K. , Screiber M. , Uniszkiewicz C. , Staryga E.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The main purpose of these studies was to show the applicability of CVD (Chemical Vapour Deposition) diamond layer in electrochemistry and to work out the technology of manufacturing diamond electrodes. Design/methodology/approach: The diamond films were deposited on tungsten substrate by HF CVD technique, and then, their quality was checked by Raman spectroscopy. It was shown, using Cyclic Voltammetry (CV) measurements, that un-doped diamond films are chemically stable in aqueous solutions. Findings: The results of cyclic voltammetry measurements show that diamond electrode on tungsten substrate is electrochemically stable in aqueous solutions over a wide potential range (-3000 mV to 2000 mV). The Raman spectra confirmed the good quality of obtained diamond layer. Research limitations/implications: In particular, it was shown that diamond electrode showed a wide potential window, very low background current, chemical and physical stability. Practical implications: Presented results showed that CVD diamond films can find application in production of diamond electrodes for electrochemical application. The sensitivity of CVD diamond layers to the electroactive species indicates on possibility of application of this material for construction of chemical and biological sensors. Originality/value: The characteristics of diamond electrodes and the resistivity of this material to the chemical attack indicate that it can be employed in a number of electrochemical applications and additionally it can work in harsh environment. The HF CVD diamond layer seems to be the new, promising and versatile material for electrochemical applications.

Słowa kluczowe

EN

electrical properties; diamond film; working electrode; cyclic voltammetry

PL

właściwości elektryczne; warstwa diamentowa; elektroda robocza; woltamperometria cykliczna

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 37, nr 2
• Strony: 486--491
• Opis fizyczny: Bibliogr. 24 poz., rys., tabl.

Twórcy

autor

Torz-Piotrowska R.

autor

Wrzyszczyński A.

autor

Paprocki K.

autor

Screiber M.

autor

Uniszkiewicz C.

autor

Staryga E.

• Faculty of Chemical Technology and Engineering, University of Technology and Life Sciences, ul. Seminaryjna 3, 85-326 Bydgoszcz, Poland,

Bibliografia

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