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Optical properties and morphology of PECVD deposited titanium dioxide films

Wybrane pełne teksty z tego czasopisma
Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Purpose: The purpose of the present work is to compare the structure and optical properties, with respect to their potential optical applications, of titanium dioxide films synthesized with the PECVD method from two different precursor materials, namely titanium tetrachloride and titanium tetraethoxide (TEOT). Design/methodology/approach: Optical properties as well as thickness of the films were analyzed by means of Variable Angle Spectroscopic Ellipsometry (VASE). Morphology studies were carried out by Scanning Electron Microscopy (SEM) and chemical composition characterisation was performed with the help of Energy Dispersive Spectroscopy (EDS) unit coupled with the electron microscope. Findings: Optical parameters approaching those of titanium dioxide were achieved for both precursors. Studies of morphology show that the films produced from TEOT have favourable, smooth surface in contradiction to broccoli-like structure obtained for the chloride precursor. The type of substance used for titanium oxides synthesis determined chemical composition of the films resulting in their enrichment with either chlorine or carbon, depending on the precursor composition. Practical implications: The optical quality of the films is good enough to suggest their applications in stack multilayer interference filters. The refractive index values of these films advocate their use as high refractive index materials while their low extinction coefficients assure the devices transparency. Originality/value: The work presents deposition rates as well as the films optical properties, chemical composition and morphology in relation to operational parameters of their synthesis. It also provides a comparison of these characteristics for two competitive precursor compounds. Finally, it presents the capability of PECVD method for the deposition of optical coatings onto polymer substrates.
Rocznik
Strony
298--303
Opis fizyczny
Bibliogr. 15 poz., rys., tabl.
Twórcy
autor
  • Institute of Materials Science and Engineering, Technical University of Lodz, ul. Stefanowskiego 1, 90-924 Łódż, Poland, jm.kowalski@wp.pl
Bibliografia
  • [1] U. Diebold, The surface science of titanium dioxide, Surface Science Reports, 48 (2003) 53-229.
  • [2] S. Lien, D. Wuu, W. Yeh, J. Liu, Tri-layer antireflection coatings (SiO2/SiO2–TiO2/TiO2) for silicon solar cells using a sol–gel technique, Solar Energy Materials & Solar Cells, 90 (2006) 2710-2719.
  • [3] C. Martinet, V. Paillard, A. Gagnaire, J. Joseph, Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating, Journal of Non- Crystalline Solids 216 (1997) 77-82.
  • [4] D. Mergel, D. Buschendorf, S. Eggert, R. Grammes, B. Samset, Density and refractive index of TiO2 films prepared by reactive evaporation, Thin Solid Films 371 (2000) 218-224.
  • [5] S. Mathur, P. Kuhn, CVD of titanium oxide coatings Comparative evaluation of thermal and plasma assisted processes, Surface and Coatings Technology 201 (2006) 807-814.
  • [6] C. Legrand-Buscema, C. Malibert, S. Bach, Elaboration and characterization of thin films of TiO2 prepared by sol-gel process, Thin Solid Films 418 (2002) 79-84.
  • [7] C. Euvananont, C. Junin, K. Inpor, P. Limthongkul, C. Thanachayanont, TiO2 optical coating layers for self-cleaning applications, Ceramics International 34 (2008) 1067-1071.
  • [8] R. M. Nowak, S. Jonas, S. Zimowski, K. Tkacz-Śmiech, Amorphous carbon layers on polymeric substrates, Journal of Achievements in Materials and Manufacturing Engineering 25/1 (2007) 23-26.
  • [9] J. Kowalski, H. Szymanowski, A. Sobczyk-Guzenda, M. Gazicki-Lipman, A stack multilayer high reflectance optical filter produced on polyester substrate with the PECVD technique, Bulletin of the Polish Academy of Sciences Technical Sciences 57/2 (2009) 171-176.
  • [10] A. Sobczyk-Guzenda, M. Gazicki-Lipman, H. Szymanowski, J. Kowalski, P. Wojciechowski, T. Halamus, A. Tracz, Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications, Thin Solid Films 517 (2009) 5409-5414.
  • [11] H. Szymanowski, A. Sobczyk, M. Gazicki-Lipman, W. Jakubowski, L. Klimek, Plasma enhanced CVD deposition of titanium oxide for biomedical applications, Surface and Coatings Technology 200 (2005) 1036-1040.
  • [12] H. Szymanowski, A. Sobczyk-Guzenda, A. Rylski, W. Jakubowski, M. Gazicki-Lipman, U. Herberth, F. Olcaytug, Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method, Thin Solid Films 515 (2007) 5275-5281.
  • [13] G. A. Battiston, U. R. Gerbasi, A. Gregori, M. Porchia, S. Cattarin, G. A. Rizzi, PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition, Thin Solid Films 371 (2000) 126-131.
  • [14] S. F. Durrant, N. C. da Cruz, E. C. Rangel, M. A. B. de Moraes, Plasma enhanced chemical vapor deposition of titanium (IV) ethoxide–oxygen–helium mixtures, Thin Solid Films 516 (2008) 4940-4945.
  • [15] N. C. da Cruz, E. C. Rangel, J. Wang, B. C. Trasferetti, C. U. Davanzo, S. G. C. Castro, M. A. B. de Moraes, Properties of titanium oxide films obtained by PECVD, Surface and Coatings Technology 126 (2000) 123-130.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-article-BOS2-0021-0024
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