CVD diamond: from growth to application

• Autorzy: Fabisiak K. , Staryga E.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The main purpose of these studies was to give a short review of basic diamonds properties and indicate possibilities of different applications of this material. As an example, the application of CVD (Chemical Vapour Deposition) diamond layer in electrochemistry was shown. Design/methodology/approach: The diamond layers were synthesized using Hot Filament CVD (HF CVD) technique from a mixture of methanol and hydrogen. The physical and electrochemical properties of the obtained layers were studied by Raman spectroscopy and Cyclic Voltammetry (CV). Findings: It was shown that it is possible to synthesize the diamond layers of different morphology and quality. Raman microprobe measurements showed that quality of diamond films deposited by HF CVD method reflect their morphology. CV measurements showed that the fabricated electrodes had wide potential window almost twice bigger in comparison to the classical Pt electrode. Research limitations/implications: The interaction of diamond layers with chemical and biological environment is not complete. Practical implications: CVD diamond (synthetic diamond made by a chemical vapour deposition process) is an important family of materials used in microelectronic and optoelectronic packaging and for laser and detector windows. Its ultra-high thermal conductivity enables to increase microprocessor frequency and output power of microelectronic and optoelectronic devices. Diamond is resistant to chemical attack and chemical sensors based on the fact it can work in harsh environment. Originality/value: The paper underlines an important role of diamond films as a promising material for production of electrodes for electrochemical applications.

Słowa kluczowe

EN

nanomaterials; diamond film; HF CVD method

PL

nanomateriały; warstwa diamentowa; metoda HF CVD

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 37, nr 2
• Strony: 264--269
• Opis fizyczny: Bibliogr. 20 poz., rys., tabl.

Twórcy

autor

Fabisiak K.

autor

Staryga E.

• Institute of Physics, Kazimierz Wielki University, pl. Weyssenhoffa 11, 85-072 Bydgoszcz, Poland,

Bibliografia

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